Presentation | 2002/9/19 A JFET Device for CMOS Integrated Circuits and Its Application to CMOS-Based Low Noise Amplifiers Hidekuni Takao, Rikiya Asaoka, Yoshiaki Ito, Kazuaki Sawada, Syoji Kawahito, Makoto Ishida, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | In this paper, a fabrication technology of JFET integration in standard CMOS is presented. JFET is used in CMOS (operational) amplifiers for realization of very low-noise sensor interface circuits. JFET devices are formed with "well" structures in standard CMOS circuits. In a p-well region, n-type channel is formed by deep P ion-implantation with energy of 150 keV to connect n+ source and drain region already formed. After that, p-type top gate is formed by B ion-implantation with energy of 30 keV. Fabricated JFET devices showed larger transconductance as compared to MOSFET devices formed on the same die. Noise power-spectrum of fabricated JFET was also evaluated, and very low-level noise amplitude was observed. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | JFET-CMOS / Low-Noise Amplifier / High Input Impedance / Sensor Interface |
Paper # | ICD2002-80 |
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Committee | ICD |
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Conference Date | 2002/9/19(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Integrated Circuits and Devices (ICD) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | A JFET Device for CMOS Integrated Circuits and Its Application to CMOS-Based Low Noise Amplifiers |
Sub Title (in English) | |
Keyword(1) | JFET-CMOS |
Keyword(2) | Low-Noise Amplifier |
Keyword(3) | High Input Impedance |
Keyword(4) | Sensor Interface |
1st Author's Name | Hidekuni Takao |
1st Author's Affiliation | Faculty of Engineering, Toyohashi University of Technology() |
2nd Author's Name | Rikiya Asaoka |
2nd Author's Affiliation | Faculty of Engineering, Toyohashi University of Technology |
3rd Author's Name | Yoshiaki Ito |
3rd Author's Affiliation | Faculty of Engineering, Toyohashi University of Technology |
4th Author's Name | Kazuaki Sawada |
4th Author's Affiliation | Faculty of Engineering, Toyohashi University of Technology |
5th Author's Name | Syoji Kawahito |
5th Author's Affiliation | Faculty of Engineering, Toyohashi University of Technology:(Present address)Research Institute of Electronics, Shizuoka University |
6th Author's Name | Makoto Ishida |
6th Author's Affiliation | Faculty of Engineering, Toyohashi University of Technology |
Date | 2002/9/19 |
Paper # | ICD2002-80 |
Volume (vol) | vol.102 |
Number (no) | 339 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |