Presentation | 2002/1/9 AlGaN/GaN HEMTの高周波特性 Y. Sano, K. Kaifu, J. Mita, T. Yamada, T. Makita, H. Ishikawa, T. Egawa, T. Jimbo, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | The AlGaN/GaN HEMT with 0.5 um gate length exhibited excellent current saturation properties without no kink effect and no current degradation and high frequency characteristics. The maximum extrinsic trans-conductance was as high as 327 mS/mm. Effective electron velocity of the HEMT with 0.5um gate length calculated from intrinsic f_T (49.7GHz) was as high as 1.56 x 10^7 cm/sec. Moreover, the HEMTs with T shape recessed gate of 0.21um gate length exhibited excellent high frequency performances. A maximum unity current cut-off frequency, f_T, of 57.2 GHz and a maximum oscillation frequency, f_ |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Gan / AlGan / HEMT / Recessed Gate / Sapphire / High Frequency |
Paper # | 2001-ED-184,2001-MW-139,2001-ICD-181 |
Date of Issue |
Conference Information | |
Committee | ICD |
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Conference Date | 2002/1/9(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
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Vice Chair | |
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Assistant |
Paper Information | |
Registration To | Integrated Circuits and Devices (ICD) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | |
Sub Title (in English) | |
Keyword(1) | Gan |
Keyword(2) | AlGan |
Keyword(3) | HEMT |
Keyword(4) | Recessed Gate |
Keyword(5) | Sapphire |
Keyword(6) | High Frequency |
1st Author's Name | Y. Sano |
1st Author's Affiliation | Corporate Research Laboratory, Oki Electric Industry Co., Ltd.() |
2nd Author's Name | K. Kaifu |
2nd Author's Affiliation | Corporate Research Laboratory, Oki Electric Industry Co., Ltd.:Ultra-Low-Loss Power Device Technology Research Body |
3rd Author's Name | J. Mita |
3rd Author's Affiliation | Corporate Research Laboratory, Oki Electric Industry Co., Ltd.:Ultra-Low-Loss Power Device Technology Research Body |
4th Author's Name | T. Yamada |
4th Author's Affiliation | Corporate Research Laboratory, Oki Electric Industry Co., Ltd.:Ultra-Low-Loss Power Device Technology Research Body |
5th Author's Name | T. Makita |
5th Author's Affiliation | Corporate Research Laboratory, Oki Electric Industry Co., Ltd.:Ultra-Low-Loss Power Device Technology Research Body |
6th Author's Name | H. Ishikawa |
6th Author's Affiliation | Nagoya Institute of Technology |
7th Author's Name | T. Egawa |
7th Author's Affiliation | Nagoya Institute of Technology |
8th Author's Name | T. Jimbo |
8th Author's Affiliation | Nagoya Institute of Technology |
Date | 2002/1/9 |
Paper # | 2001-ED-184,2001-MW-139,2001-ICD-181 |
Volume (vol) | vol.101 |
Number (no) | 555 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |