| Presentation | 1999/8/26 An Efficient Method for Monte Carlo Ion Implantation Simulation takahisa kanemura, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | An efficient trajectory split method for monte carlo ion implantation simulation is presented. This method permits users specify the lower limit of calculated concentration, instead of the splitting number. It is convenient for semiconductor device designers. In addition, since the split in high concentration region is suppressed, the calculation time is efficiently reduced. This method was implemented to the in-house ID and 2D simulator, and the required time was 1/100-1/1000, compared with non spliting case. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Monte Carlo / Jon Implantation Simulation / Statistical Noise / Trajectory Split Method |
| Paper # | ICD99-128 |
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| Conference Information | |
| Committee | ICD |
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| Conference Date | 1999/8/26(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Integrated Circuits and Devices (ICD) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | An Efficient Method for Monte Carlo Ion Implantation Simulation |
| Sub Title (in English) | |
| Keyword(1) | Monte Carlo |
| Keyword(2) | Jon Implantation Simulation |
| Keyword(3) | Statistical Noise |
| Keyword(4) | Trajectory Split Method |
| 1st Author's Name | takahisa kanemura |
| 1st Author's Affiliation | Microelectronics Engineering Laboratory TOSHIBA Corporation Semiconductor Company() |
| Date | 1999/8/26 |
| Paper # | ICD99-128 |
| Volume (vol) | vol.99 |
| Number (no) | 265 |
| Page | pp.pp.- |
| #Pages | 8 |
| Date of Issue | |