Presentation 1999/7/23
Properties of MFSFET's with Various Gate Electrodes Using LiNbO_3/Si (100) Structures
Kwang-Ho Kim, Soon-Won Jung, Chae-Gyu Kim, Byoung-Gon Yu, Won-Jae Lee,
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Abstract(in English) MFSFET's with various gate electrodes, that are aluminum, platinum and poly-Si, using LiNbO_3/Si (100) structures were fabricated and the properties of the FET's have been discussed. The gate leakage current density of the MFS device using a Pt electrode showed the least value of low 10^<-8> A/cm^2 orders at the field of 500 kV/ cm. The drain current as a function of retention time of the FET using Pt electrode remained almost the same value of its initial value over 2 days at room temperature.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Gate electrode dependence / Ferroelectric film / LiNbO_3/Si (100) structure / MFSFET / Non-volatile memory
Paper # ICD99-119
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Conference Date 1999/7/23(1days)
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Registration To Integrated Circuits and Devices (ICD)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Properties of MFSFET's with Various Gate Electrodes Using LiNbO_3/Si (100) Structures
Sub Title (in English)
Keyword(1) Gate electrode dependence
Keyword(2) Ferroelectric film
Keyword(3) LiNbO_3/Si (100) structure
Keyword(4) MFSFET
Keyword(5) Non-volatile memory
1st Author's Name Kwang-Ho Kim
1st Author's Affiliation Department of Semiconductor Engineering, Cheongju University()
2nd Author's Name Soon-Won Jung
2nd Author's Affiliation Department of Semiconductor Engineering, Cheongju University
3rd Author's Name Chae-Gyu Kim
3rd Author's Affiliation Department of Semiconductor Engineering, Cheongju University
4th Author's Name Byoung-Gon Yu
4th Author's Affiliation Electronics and Telecommunications Research Institute
5th Author's Name Won-Jae Lee
5th Author's Affiliation Electronics and Telecommunications Research Institute
Date 1999/7/23
Paper # ICD99-119
Volume (vol) vol.99
Number (no) 234
Page pp.pp.-
#Pages 6
Date of Issue