Presentation | 1999/7/23 Production-Worthy Full Process Integration of Ta_2O_5 Capacitor Technology Chan Kim, Ki-Seon Park, Kyong-Min Kim, Min-Soo Kim, Sang-Kyoo Lee, Yo-Hwan Koh, Chung-Tae Kim, Nam-Jin Bae, Sang-Ho Kim, |
---|---|
PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | A full process integration of Ta_2O_5/HSG capacitor technology has been developed for 1Gbit DRAM and beyond. This Ta_2O_5/HSG capacitor technology consists of the surface treatment of storage poly-Si, the cyclic Ta_2O_5 deposition, and the fully planarized PMD(pre-metal dielectrics) process. The excellent electrical properties of the Ta_2O_5 /HSG capacitor technology have been achieved in 1Gbit DRAM. The refresh time and the package level reliability tests in 0.32 μm DRAM demonstrated that the Ta_2O_5 capacitor technology in this work can be applied to DRAM mass products and is reliable. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Ta_2O_5 capacitor / PMD planarization / HSG / Surface treatment / cyclic Ta_2O_5 deposition / Refresh time / 0.32 μm DRAM products / Package level reliability |
Paper # | ICD99-113 |
Date of Issue |
Conference Information | |
Committee | ICD |
---|---|
Conference Date | 1999/7/23(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Integrated Circuits and Devices (ICD) |
---|---|
Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Production-Worthy Full Process Integration of Ta_2O_5 Capacitor Technology |
Sub Title (in English) | |
Keyword(1) | Ta_2O_5 capacitor |
Keyword(2) | PMD planarization |
Keyword(3) | HSG |
Keyword(4) | Surface treatment |
Keyword(5) | cyclic Ta_2O_5 deposition |
Keyword(6) | Refresh time |
Keyword(7) | 0.32 μm DRAM products |
Keyword(8) | Package level reliability |
1st Author's Name | Chan Kim |
1st Author's Affiliation | Memory R & D Division, Hyundai Electronics Industries Co. Ltd.() |
2nd Author's Name | Ki-Seon Park |
2nd Author's Affiliation | Memory R & D Division, Hyundai Electronics Industries Co. Ltd. |
3rd Author's Name | Kyong-Min Kim |
3rd Author's Affiliation | Memory R & D Division, Hyundai Electronics Industries Co. Ltd. |
4th Author's Name | Min-Soo Kim |
4th Author's Affiliation | Memory R & D Division, Hyundai Electronics Industries Co. Ltd. |
5th Author's Name | Sang-Kyoo Lee |
5th Author's Affiliation | Memory R & D Division, Hyundai Electronics Industries Co. Ltd. |
6th Author's Name | Yo-Hwan Koh |
6th Author's Affiliation | Memory R & D Division, Hyundai Electronics Industries Co. Ltd. |
7th Author's Name | Chung-Tae Kim |
7th Author's Affiliation | Memory R & D Division, Hyundai Electronics Industries Co. Ltd. |
8th Author's Name | Nam-Jin Bae |
8th Author's Affiliation | APEX Co Ltd |
9th Author's Name | Sang-Ho Kim |
9th Author's Affiliation | APEX Co Ltd |
Date | 1999/7/23 |
Paper # | ICD99-113 |
Volume (vol) | vol.99 |
Number (no) | 234 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |