| Presentation | 1999/7/23 Optimization of Postannealing Process for Low Temperature MOCVD (Ba, Sr) TiO_3 Thin Films Jaehoo Park, Cheol Seong Hwang, Doo Young Yang, Cheol Hoon Yang, Young Ki Han, Chul Ju Hwang, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | 30-run-thick (Ba,Sr)TiO_3 thin films deposited by liquid source MOCVD at 400℃ were post-annealed before top electrode deposition in order to remove the hydrocarbon in thin films. By annealing at a low temperature of 500℃ and a high temperature of 700℃, high dielectric constant (170) an low leakage current density (less than 1.0×10^<-8> A/cm^2 at ±1V) were achieved. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Dielectric Thin film / BST / DRAM / MOCVD / hydrocarbon / multi-step post-annealing |
| Paper # | ICD99-111 |
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| Conference Information | |
| Committee | ICD |
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| Conference Date | 1999/7/23(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Integrated Circuits and Devices (ICD) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Optimization of Postannealing Process for Low Temperature MOCVD (Ba, Sr) TiO_3 Thin Films |
| Sub Title (in English) | |
| Keyword(1) | Dielectric Thin film |
| Keyword(2) | BST |
| Keyword(3) | DRAM |
| Keyword(4) | MOCVD |
| Keyword(5) | hydrocarbon |
| Keyword(6) | multi-step post-annealing |
| 1st Author's Name | Jaehoo Park |
| 1st Author's Affiliation | School of Material Science and Engineering, Seoul National University() |
| 2nd Author's Name | Cheol Seong Hwang |
| 2nd Author's Affiliation | School of Material Science and Engineering, Seoul National University |
| 3rd Author's Name | Doo Young Yang |
| 3rd Author's Affiliation | Jusung Engineering |
| 4th Author's Name | Cheol Hoon Yang |
| 4th Author's Affiliation | Jusung Engineering |
| 5th Author's Name | Young Ki Han |
| 5th Author's Affiliation | Jusung Engineering |
| 6th Author's Name | Chul Ju Hwang |
| 6th Author's Affiliation | Jusung Engineering |
| Date | 1999/7/23 |
| Paper # | ICD99-111 |
| Volume (vol) | vol.99 |
| Number (no) | 234 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |