Presentation | 1999/1/21 Fabrication of Submillimeter Components Using UV-curable Photosensitive plastics Tetze Hamano, M.Lubecke Victor, Koji Mizuno, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | High performance circuits in millimeter and submillimeter wave regions require the employment of extremely small three-dimensional waveguides and other components. The fabrication of the submillimeter wave circuits is quite difficult as well as much costly by the conventional machining technique. Micromachining technique can be employed to solve the fabrication problem. We have developed the photolithography technique for the production of submillimeter wave components using ultra-thick UV-curable resin for micromachining technique, while such technique can be extremely process sensitive. The technique can allow the batch production of a number of submillimeter-sized components simultaneously. We have demonstrated waveguide backshorts in the frequency ranges of 2.5 THz and 640 GHz as well as dichroic plates for 640 GHz. The UV-curable resin can be useful to fabricate submillimeter wave components, due to its possibility of the complicated structure having a high aspect ratio more than 10. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Submillimeter waves / Waveguide components / UV-curable resin / MEMS |
Paper # | ED98-198,MW98-161,ICD98-265 |
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Conference Information | |
Committee | ICD |
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Conference Date | 1999/1/21(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Vice Chair | |
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Paper Information | |
Registration To | Integrated Circuits and Devices (ICD) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication of Submillimeter Components Using UV-curable Photosensitive plastics |
Sub Title (in English) | |
Keyword(1) | Submillimeter waves |
Keyword(2) | Waveguide components |
Keyword(3) | UV-curable resin |
Keyword(4) | MEMS |
1st Author's Name | Tetze Hamano |
1st Author's Affiliation | Research Institute of Electrical Communication, Tohoku University() |
2nd Author's Name | M.Lubecke Victor |
2nd Author's Affiliation | Photodynamics Research Center, The Institute of Physical and Chemical Research(RIKEN). :)Presen address)Presently with Bell Laboratory, Lucent Technologies |
3rd Author's Name | Koji Mizuno |
3rd Author's Affiliation | Research Institute of Electrical Communication, Tohoku University |
Date | 1999/1/21 |
Paper # | ED98-198,MW98-161,ICD98-265 |
Volume (vol) | vol.98 |
Number (no) | 524 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |