| Presentation | 1999/1/20 Process Induced Damage on RFCMOS E. Morifuji, T. Ohguro, T. Yoshitomi, H. Kimijima, T. Morimoto, H.S. Momose, Y. Katsumata, H. Iwai, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have investigated the correlation between process induced damage and RF analog characteristics. Vth matching, fmax, and NFmin were analyzed using mass data. It was found that the redistribution of channel profile due to the damage induced by ion implantation at the gate edge affects the spread of fmax and NFmin. This tendency was not apparent in the spread of fT. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Process damage / RF characteristics / CMOS / Analog / Spread |
| Paper # | ED98-193,MW98-156,ICD98-260 |
| Date of Issue |
| Conference Information | |
| Committee | ICD |
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| Conference Date | 1999/1/20(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Integrated Circuits and Devices (ICD) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Process Induced Damage on RFCMOS |
| Sub Title (in English) | |
| Keyword(1) | Process damage |
| Keyword(2) | RF characteristics |
| Keyword(3) | CMOS |
| Keyword(4) | Analog |
| Keyword(5) | Spread |
| 1st Author's Name | E. Morifuji |
| 1st Author's Affiliation | Toshiba Corporation() |
| 2nd Author's Name | T. Ohguro |
| 2nd Author's Affiliation | Toshiba Corporation |
| 3rd Author's Name | T. Yoshitomi |
| 3rd Author's Affiliation | Toshiba Corporation |
| 4th Author's Name | H. Kimijima |
| 4th Author's Affiliation | Toshiba Corporation |
| 5th Author's Name | T. Morimoto |
| 5th Author's Affiliation | Toshiba Corporation |
| 6th Author's Name | H.S. Momose |
| 6th Author's Affiliation | Toshiba Corporation |
| 7th Author's Name | Y. Katsumata |
| 7th Author's Affiliation | Toshiba Corporation |
| 8th Author's Name | H. Iwai |
| 8th Author's Affiliation | Toshiba Corporation |
| Date | 1999/1/20 |
| Paper # | ED98-193,MW98-156,ICD98-260 |
| Volume (vol) | vol.98 |
| Number (no) | 523 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |