Presentation 1997/9/25
Simulation Study on Extraction Mechanism of Generated Holes in the Floating-body SOI MOSFETs
Kouichi NOSE, Rimon IKENO, Kunihiro ASADA,
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Abstract(in English) In order to suppress the floating-body effect of fully-depleted SOI MOSFET's, a method by implantation of ionized Ar in source/drain region has been proposed. In this study, we investigated the mechanism of promoting the flow of the excess holes in body to source region in Ar-implanted SOI MOSFET using 2-D device simulation. From this simulation, we conclude that it is necessary to introduce not only the effect where recombination rate is enhanced in Ar-implanted region but also the effect where bandgap is narrowed in the Ar-implanted region with extended lattice by Ar in the center of Si-lattice.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) SOI MOSFET / Floating-body effect / implantation of ionized Ar / 2-D device simulation
Paper # ICD97-132
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Conference Date 1997/9/25(1days)
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Registration To Integrated Circuits and Devices (ICD)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Simulation Study on Extraction Mechanism of Generated Holes in the Floating-body SOI MOSFETs
Sub Title (in English)
Keyword(1) SOI MOSFET
Keyword(2) Floating-body effect
Keyword(3) implantation of ionized Ar
Keyword(4) 2-D device simulation
1st Author's Name Kouichi NOSE
1st Author's Affiliation Graduate School of Engineering, University of Tokyo()
2nd Author's Name Rimon IKENO
2nd Author's Affiliation Graduate School of Engineering, University of Tokyo:(Present adress)Texas Instruments Tsukuba R&D Center
3rd Author's Name Kunihiro ASADA
3rd Author's Affiliation Graduate School of Engineering, University of Tokyo:(Present adress)VLSI Design and Education Center, University of Tokyo
Date 1997/9/25
Paper # ICD97-132
Volume (vol) vol.97
Number (no) 274
Page pp.pp.-
#Pages 7
Date of Issue