Presentation | 1997/9/25 Simulation Study on Extraction Mechanism of Generated Holes in the Floating-body SOI MOSFETs Kouichi NOSE, Rimon IKENO, Kunihiro ASADA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | In order to suppress the floating-body effect of fully-depleted SOI MOSFET's, a method by implantation of ionized Ar in source/drain region has been proposed. In this study, we investigated the mechanism of promoting the flow of the excess holes in body to source region in Ar-implanted SOI MOSFET using 2-D device simulation. From this simulation, we conclude that it is necessary to introduce not only the effect where recombination rate is enhanced in Ar-implanted region but also the effect where bandgap is narrowed in the Ar-implanted region with extended lattice by Ar in the center of Si-lattice. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | SOI MOSFET / Floating-body effect / implantation of ionized Ar / 2-D device simulation |
Paper # | ICD97-132 |
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Conference Information | |
Committee | ICD |
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Conference Date | 1997/9/25(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Integrated Circuits and Devices (ICD) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Simulation Study on Extraction Mechanism of Generated Holes in the Floating-body SOI MOSFETs |
Sub Title (in English) | |
Keyword(1) | SOI MOSFET |
Keyword(2) | Floating-body effect |
Keyword(3) | implantation of ionized Ar |
Keyword(4) | 2-D device simulation |
1st Author's Name | Kouichi NOSE |
1st Author's Affiliation | Graduate School of Engineering, University of Tokyo() |
2nd Author's Name | Rimon IKENO |
2nd Author's Affiliation | Graduate School of Engineering, University of Tokyo:(Present adress)Texas Instruments Tsukuba R&D Center |
3rd Author's Name | Kunihiro ASADA |
3rd Author's Affiliation | Graduate School of Engineering, University of Tokyo:(Present adress)VLSI Design and Education Center, University of Tokyo |
Date | 1997/9/25 |
Paper # | ICD97-132 |
Volume (vol) | vol.97 |
Number (no) | 274 |
Page | pp.pp.- |
#Pages | 7 |
Date of Issue |