| Presentation | 2002/6/14 Analysis of ZrO_2/Si Interface by High-resolution RBS Kaoru SASAKAWA, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | ZrO_2/Si is analyzed by high-resolution RBS to clarify the composition and the thickness of the interface layer. Some difference are found for the different process condition such as oxygen concentration and annealing. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | High-resolution RBS / ZrO_2 |
| Paper # | SDM2002-60 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2002/6/14(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Analysis of ZrO_2/Si Interface by High-resolution RBS |
| Sub Title (in English) | |
| Keyword(1) | High-resolution RBS |
| Keyword(2) | ZrO_2 |
| 1st Author's Name | Kaoru SASAKAWA |
| 1st Author's Affiliation | Electronics Division, Kobelco Research Institute Inc.() |
| Date | 2002/6/14 |
| Paper # | SDM2002-60 |
| Volume (vol) | vol.102 |
| Number (no) | 134 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |