Presentation 2002/5/17
Investigation of electron irradiation induced defects in single crystal CuInSe_2 thin films
Naoki FUJITA, Lee HAE-SEOK, Hiroshi OKADA, Akihiro WAKAHARA, Akira YOSHIDA, Takeshi OHSHIMA, Hisayoshi ITOH,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) For the purpose of investigating the damage over the radiation of CuInSe_2 thin film electrical properties of as-grown and electron irradiated (2MeV and 3MeV) single crystal CuInSe_2 thin films have been characterized. CuJnSe_2 thin films were epitaxially grown on GaAs substrates by RF sputtering. As the electron irradiation exceeded 1× 10^<17>cm^<-2> the carrier density of CuInSe_2 thin films were decreased. Deep Level Transient Spectroscopy (DLTS) measurement of electron irradiated sample showed existence of different kind of deep levels after the high-energy electron irradiation.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) CuInSe_2 / DLTS / electron irradiation / activation energy / capture cross section
Paper # SDM2002-41
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Conference Information
Committee SDM
Conference Date 2002/5/17(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Investigation of electron irradiation induced defects in single crystal CuInSe_2 thin films
Sub Title (in English)
Keyword(1) CuInSe_2
Keyword(2) DLTS
Keyword(3) electron irradiation
Keyword(4) activation energy
Keyword(5) capture cross section
1st Author's Name Naoki FUJITA
1st Author's Affiliation Department of Electrical and Electronic Engineering, Toyohashi University of Technology()
2nd Author's Name Lee HAE-SEOK
2nd Author's Affiliation Department of Electrical and Electronic Engineering, Toyohashi University of Technology
3rd Author's Name Hiroshi OKADA
3rd Author's Affiliation Department of Electrical and Electronic Engineering, Toyohashi University of Technology
4th Author's Name Akihiro WAKAHARA
4th Author's Affiliation Department of Electrical and Electronic Engineering, Toyohashi University of Technology
5th Author's Name Akira YOSHIDA
5th Author's Affiliation Department of Electrical and Electronic Engineering, Toyohashi University of Technology
6th Author's Name Takeshi OHSHIMA
6th Author's Affiliation Japan Atomic Energy Research Institute
7th Author's Name Hisayoshi ITOH
7th Author's Affiliation Japan Atomic Energy Research Institute
Date 2002/5/17
Paper # SDM2002-41
Volume (vol) vol.102
Number (no) 81
Page pp.pp.-
#Pages 6
Date of Issue