Presentation 2001/5/18
Dependence of Mechanism for Si SET with Oxidation-Induced Strain and Quantum-Mechanical Size Effect on Conduction Direction
Seiji Horiguchi, Masao Nagase, Kenji Shiraishi, Hiroyuki Kageshima, Yasuo Takahashi,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have investigated the conduction-direction dependence of the mechanism for Si SET with the oxidation-induced strain and the quantum-mechanical size effect, using the first-principles calculation, the deformation potential and the effective potential method. In this mechanism, the reduction of geometric structure in a wire region produces a tunnel barrier through the quantum-mechanical size effect, while the compressive stress generated during oxidation in the wire region forms a potential well corresponding to an island in the tunnel barrier through the bandgap reduction due to strain. It has been shown that the SET can operate with the same mechanism in the arbitrary conduction direction in the (001) plane as well as [110] direction previously reported.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Si SET / PADOX / strain effect / operation mechanism / conduction-directiondependence
Paper # ED2001-42,CPM2001-29,SDM2001-42
Date of Issue

Conference Information
Committee SDM
Conference Date 2001/5/18(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Dependence of Mechanism for Si SET with Oxidation-Induced Strain and Quantum-Mechanical Size Effect on Conduction Direction
Sub Title (in English)
Keyword(1) Si SET
Keyword(2) PADOX
Keyword(3) strain effect
Keyword(4) operation mechanism
Keyword(5) conduction-directiondependence
1st Author's Name Seiji Horiguchi
1st Author's Affiliation NTT Basic Research Laboratories()
2nd Author's Name Masao Nagase
2nd Author's Affiliation NTT Basic Research Laboratories
3rd Author's Name Kenji Shiraishi
3rd Author's Affiliation NTT Basic Research Laboratories:(Present address) Institute of Physics, University of Tsukuba
4th Author's Name Hiroyuki Kageshima
4th Author's Affiliation NTT Basic Research Laboratories
5th Author's Name Yasuo Takahashi
5th Author's Affiliation NTT Basic Research Laboratories
Date 2001/5/18
Paper # ED2001-42,CPM2001-29,SDM2001-42
Volume (vol) vol.101
Number (no) 83
Page pp.pp.-
#Pages 6
Date of Issue