Presentation | 2001/5/18 Influence on Schottky contacts of sacrificial anodic oxidation for 6H-SiC Masashi Kato, Masaya Ichimura, Eisuke Arai, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We attemped to form oxide films on n-type 6H-SiC by an anodic oxidation method. As electrolyte, mixed solution of ethylene-glycol, water and KNO_3 was employed. Anodic oxide was formed on 6H-SiC by appling voltage to 6H-SiC. The oxide was not pure SiO_2 but it was etched by HF. Formation rate of the anodic oxide was much higher than typical thermal oxidation rate for 6H-SiC. Schottky contacts were formed on the oxide-etched surface. Then we investigated influence of sacrificial anodic oxidation on Schottky contacts and we found influence similar to that of the sacrificail thermal oxidation. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | 6H-SiC / anodic oxidation / sacrificial oxidation / Schottky contact |
Paper # | ED2001-32,CPM2001-19,SDM2001-32 |
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Conference Information | |
Committee | SDM |
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Conference Date | 2001/5/18(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Influence on Schottky contacts of sacrificial anodic oxidation for 6H-SiC |
Sub Title (in English) | |
Keyword(1) | 6H-SiC |
Keyword(2) | anodic oxidation |
Keyword(3) | sacrificial oxidation |
Keyword(4) | Schottky contact |
1st Author's Name | Masashi Kato |
1st Author's Affiliation | Nagoya Institute of Technology() |
2nd Author's Name | Masaya Ichimura |
2nd Author's Affiliation | Nagoya Institute of Technology |
3rd Author's Name | Eisuke Arai |
3rd Author's Affiliation | Nagoya Institute of Technology |
Date | 2001/5/18 |
Paper # | ED2001-32,CPM2001-19,SDM2001-32 |
Volume (vol) | vol.101 |
Number (no) | 83 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |