Presentation 2001/5/18
Influence on Schottky contacts of sacrificial anodic oxidation for 6H-SiC
Masashi Kato, Masaya Ichimura, Eisuke Arai,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We attemped to form oxide films on n-type 6H-SiC by an anodic oxidation method. As electrolyte, mixed solution of ethylene-glycol, water and KNO_3 was employed. Anodic oxide was formed on 6H-SiC by appling voltage to 6H-SiC. The oxide was not pure SiO_2 but it was etched by HF. Formation rate of the anodic oxide was much higher than typical thermal oxidation rate for 6H-SiC. Schottky contacts were formed on the oxide-etched surface. Then we investigated influence of sacrificial anodic oxidation on Schottky contacts and we found influence similar to that of the sacrificail thermal oxidation.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) 6H-SiC / anodic oxidation / sacrificial oxidation / Schottky contact
Paper # ED2001-32,CPM2001-19,SDM2001-32
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Committee SDM
Conference Date 2001/5/18(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Influence on Schottky contacts of sacrificial anodic oxidation for 6H-SiC
Sub Title (in English)
Keyword(1) 6H-SiC
Keyword(2) anodic oxidation
Keyword(3) sacrificial oxidation
Keyword(4) Schottky contact
1st Author's Name Masashi Kato
1st Author's Affiliation Nagoya Institute of Technology()
2nd Author's Name Masaya Ichimura
2nd Author's Affiliation Nagoya Institute of Technology
3rd Author's Name Eisuke Arai
3rd Author's Affiliation Nagoya Institute of Technology
Date 2001/5/18
Paper # ED2001-32,CPM2001-19,SDM2001-32
Volume (vol) vol.101
Number (no) 83
Page pp.pp.-
#Pages 6
Date of Issue