Presentation 2001/3/5
Fabrication and Electrical Properties of Ferroelectric-gate FET with Epitaxial Gate Structure
S. Migita, K. Sakamaki, S.-B. Xiong, H. Ota, Y. Tarui, S. Sakai,
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Abstract(in English) An epitaxially stacked gate structure is formed by a pulsed laser deposition method and applied to the ferroelectric-gate FET memory. A ferroelectric SrBi_2Ta_2O_9 film on Si(001) via insulating SrTiO_3/Ce_<0.12>Zr_<0.88>O_2 layers is grown in an epitaxial manner with its c-axis inclined 45° to the substrate normal. Electrical measurements for the MFIS diode show memory property caused by the reinanent polarization of the ferroelectric and retention time longer than 10 days. Memory property is also confirmed in an MFIS-FET with retention time longer than 2 hours.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) ferroelectric / transistor / memory / epitaxy / silicon
Paper # SDM2000-234
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Conference Information
Committee SDM
Conference Date 2001/3/5(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication and Electrical Properties of Ferroelectric-gate FET with Epitaxial Gate Structure
Sub Title (in English)
Keyword(1) ferroelectric
Keyword(2) transistor
Keyword(3) memory
Keyword(4) epitaxy
Keyword(5) silicon
1st Author's Name S. Migita
1st Author's Affiliation Electrotechnical Laboratory()
2nd Author's Name K. Sakamaki
2nd Author's Affiliation Nippon Precision Circuits Inc.
3rd Author's Name S.-B. Xiong
3rd Author's Affiliation Electrotechnical Laboratory
4th Author's Name H. Ota
4th Author's Affiliation Electrotechnical Laboratory
5th Author's Name Y. Tarui
5th Author's Affiliation Electrotechnical Laboratory
6th Author's Name S. Sakai
6th Author's Affiliation Electrotechnical Laboratory
Date 2001/3/5
Paper # SDM2000-234
Volume (vol) vol.100
Number (no) 652
Page pp.pp.-
#Pages 8
Date of Issue