Presentation 2001/2/21
Fabrication of GaN dots array on Si substrate by selective area growth method
Masahito Yamaguchi, Yoshio Honda, Nobuhiko Sawaki,
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Abstract(in English) We have fabricated sub-micron GaN dots array on(111)Si substrate by metal organic vapor phase epitaxy(MOVPE)selective area growth. The SiO_2 mask for the selective area growth was prepared with electron beam lithography system and the circle window diameter of the mask was less than 250 nm. The bottom and top surface size of the fabricated GaN dots was about 250 nm and 50 nm, respectively. In comparison with the GaN dots grown on sapphire substrate, the shape of the facet was found to be clear. The optical properties in the GaN dot on Si substrate are relatively good. Therefore, the(111)Si substrate is suitable for the fabrication of the GaN quantum dots.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN dot / (111)Si substrate / selective area growth / electron beam lithography / MOVPE
Paper # ED2000-246,SDM2000-200
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Committee SDM
Conference Date 2001/2/21(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of GaN dots array on Si substrate by selective area growth method
Sub Title (in English)
Keyword(1) GaN dot
Keyword(2) (111)Si substrate
Keyword(3) selective area growth
Keyword(4) electron beam lithography
Keyword(5) MOVPE
1st Author's Name Masahito Yamaguchi
1st Author's Affiliation Department of Electronics, Graduate School of Engineering, Nagoya University()
2nd Author's Name Yoshio Honda
2nd Author's Affiliation Department of Electronics, Graduate School of Engineering, Nagoya University
3rd Author's Name Nobuhiko Sawaki
3rd Author's Affiliation Department of Electronics, Graduate School of Engineering, Nagoya University
Date 2001/2/21
Paper # ED2000-246,SDM2000-200
Volume (vol) vol.100
Number (no) 643
Page pp.pp.-
#Pages 6
Date of Issue