Presentation 2000/5/12
Conductivity type control of ZnO
Nuttawuth Buthrath, Arun Vir Singh, Yoshihito Hiroe, Akihiro Wakahara, Akira Yoshida,
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Abstract(in English) In this research, we deposited ZnO thin films by sputter method using ZnO target doped with N and Ga. In this experiment area ratio of ZnO target and GaN pieces was 9:1. We obtained p-type Zinc Oxide thin film. Resistivity, carrier concentration and mobility were 37.6[Ωcm], 9×10^<15>[cm^<-3>]and 18.5[cm^2/V・s], respectively.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Transparent conducting ZnO / Sputter
Paper # ED2000-30,CPM2000-15,SDM2000-30
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Committee SDM
Conference Date 2000/5/12(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Conductivity type control of ZnO
Sub Title (in English)
Keyword(1) Transparent conducting ZnO
Keyword(2) Sputter
1st Author's Name Nuttawuth Buthrath
1st Author's Affiliation Toyohashi University of Technology()
2nd Author's Name Arun Vir Singh
2nd Author's Affiliation Toyohashi University of Technology
3rd Author's Name Yoshihito Hiroe
3rd Author's Affiliation Toyohashi University of Technology
4th Author's Name Akihiro Wakahara
4th Author's Affiliation Toyohashi University of Technology
5th Author's Name Akira Yoshida
5th Author's Affiliation Toyohashi University of Technology
Date 2000/5/12
Paper # ED2000-30,CPM2000-15,SDM2000-30
Volume (vol) vol.100
Number (no) 62
Page pp.pp.-
#Pages 5
Date of Issue