Presentation 2000/6/21
ED2000-56 / SDM2000-56 Room Temperature Negative Differential Resistance of CdF_2-CaF_2 Resonant Tunneling Diode on Si(111)
Masahiro Watanbe, Toshiyuki Funayama, Taishi Teraji, Naoto Sakamaki,
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Abstract(in English) CdF_2-CaF_2 heterostructures are attractive materials for quantum devices on silicon substrate because of large conduction band discontinuity of 2.9eV at the heterointerface. We have demonstrated room temperature negative differential resistance of double barrier resonant tunneling diode (DBRTD) structures and peak to valley current ratio (PVR) of more than 10^5 has been achieved using CaF_2 grown by molecular beam epitaxy combined with partially ionized beam technique on Si(111) 0.07° misscut substrate.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Resonant tunneling diode / Silicon / CaF_2 / CdF_2 / Heterostructure / Peak to valley ratio
Paper # ED2000-56,SDM2000-56
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Committee SDM
Conference Date 2000/6/21(1days)
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Registration To Silicon Device and Materials (SDM)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) ED2000-56 / SDM2000-56 Room Temperature Negative Differential Resistance of CdF_2-CaF_2 Resonant Tunneling Diode on Si(111)
Sub Title (in English)
Keyword(1) Resonant tunneling diode
Keyword(2) Silicon
Keyword(3) CaF_2
Keyword(4) CdF_2
Keyword(5) Heterostructure
Keyword(6) Peak to valley ratio
1st Author's Name Masahiro Watanbe
1st Author's Affiliation Tokyo Institute of Technology()
2nd Author's Name Toshiyuki Funayama
2nd Author's Affiliation Tokyo Institute of Technology
3rd Author's Name Taishi Teraji
3rd Author's Affiliation Tokyo Institute of Technology
4th Author's Name Naoto Sakamaki
4th Author's Affiliation Tokyo Institute of Technology
Date 2000/6/21
Paper # ED2000-56,SDM2000-56
Volume (vol) vol.100
Number (no) 150
Page pp.pp.-
#Pages 5
Date of Issue