講演名 2000/6/21
ED2000-54 / SDM2000-54 Microprocessor Technologies beyond GHz
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抄録(和)
抄録(英) Aggressive transistor scaling has been the key factor for high performance microprocessor fabrication. As a result, the gate oxide is now in a regime that large direct tunneling leakage current might cause a serious circuit instability, reliability problem and high power consumption. Ultra-shallow S / D extension is also a limiting factor in terms of the trade-off between short-channel effect suppression and high series resistance. The threshold voltage scaling limit due to the signal-to-noise margin makes hard to meet the transistor performance target for low power supply voltage. SOI device provides an attractive solution in terms of low voltage / power operation and improved performance. However, its inherent floating body effects must be carefully engineered for the successful circuit integration. Pass-gate leakage current and history-dependent switching delay are the most important issues to be addressed. Future sub-0.13μm generation will requir SOI device architecture with new gate dielectric, elevated S / D extension and metal gate electrode. Interconnect delay is another significant factor in chip performance. Future interconnect technology will require a new material such as Cu with low resistivity and high electromigration resistance, as well as low-k intermetal dielectrics (MD) with reliable thermal and electrical properties.
キーワード(和)
キーワード(英) Microprocessor / gate oxide / direct-tunneling / shallow junction / SOI / pass-gate leakage / dynamic instability / interconnect / Cu / resistivity / electromigration / HSQ / line-to-line capacitance
資料番号 ED2000-54,SDM2000-54
発行日

研究会情報
研究会 SDM
開催期間 2000/6/21(から1日開催)
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開催地(英)
テーマ(和)
テーマ(英)
委員長氏名(和)
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副委員長氏名(和)
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講演論文情報詳細
申込み研究会 Silicon Device and Materials (SDM)
本文の言語 ENG
タイトル(和)
サブタイトル(和)
タイトル(英) ED2000-54 / SDM2000-54 Microprocessor Technologies beyond GHz
サブタイトル(和)
キーワード(1)(和/英) / Microprocessor
第 1 著者 氏名(和/英) / Jeong-Hwan Yang
第 1 著者 所属(和/英)
Samsung Electronics Co., Ltd.
発表年月日 2000/6/21
資料番号 ED2000-54,SDM2000-54
巻番号(vol) vol.100
号番号(no) 150
ページ範囲 pp.-
ページ数 6
発行日