講演名 | 2000/6/21 ED2000-54 / SDM2000-54 Microprocessor Technologies beyond GHz , |
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抄録(和) | |
抄録(英) | Aggressive transistor scaling has been the key factor for high performance microprocessor fabrication. As a result, the gate oxide is now in a regime that large direct tunneling leakage current might cause a serious circuit instability, reliability problem and high power consumption. Ultra-shallow S / D extension is also a limiting factor in terms of the trade-off between short-channel effect suppression and high series resistance. The threshold voltage scaling limit due to the signal-to-noise margin makes hard to meet the transistor performance target for low power supply voltage. SOI device provides an attractive solution in terms of low voltage / power operation and improved performance. However, its inherent floating body effects must be carefully engineered for the successful circuit integration. Pass-gate leakage current and history-dependent switching delay are the most important issues to be addressed. Future sub-0.13μm generation will requir SOI device architecture with new gate dielectric, elevated S / D extension and metal gate electrode. Interconnect delay is another significant factor in chip performance. Future interconnect technology will require a new material such as Cu with low resistivity and high electromigration resistance, as well as low-k intermetal dielectrics (MD) with reliable thermal and electrical properties. |
キーワード(和) | |
キーワード(英) | Microprocessor / gate oxide / direct-tunneling / shallow junction / SOI / pass-gate leakage / dynamic instability / interconnect / Cu / resistivity / electromigration / HSQ / line-to-line capacitance |
資料番号 | ED2000-54,SDM2000-54 |
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研究会情報 | |
研究会 | SDM |
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開催期間 | 2000/6/21(から1日開催) |
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講演論文情報詳細 | |
申込み研究会 | Silicon Device and Materials (SDM) |
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本文の言語 | ENG |
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サブタイトル(和) | |
タイトル(英) | ED2000-54 / SDM2000-54 Microprocessor Technologies beyond GHz |
サブタイトル(和) | |
キーワード(1)(和/英) | / Microprocessor |
第 1 著者 氏名(和/英) | / Jeong-Hwan Yang |
第 1 著者 所属(和/英) | Samsung Electronics Co., Ltd. |
発表年月日 | 2000/6/21 |
資料番号 | ED2000-54,SDM2000-54 |
巻番号(vol) | vol.100 |
号番号(no) | 150 |
ページ範囲 | pp.- |
ページ数 | 6 |
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