Presentation | 2000/3/9 Preparation and Properties of Bi_2SiO_5/Si Structures Kouji Hiraki, Masaki Yamaguchi, Takao Nagatomo, Yoichiro Masuda, |
---|---|
PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Bismuth silicate (Bi_2SiO_5) films, expected as the buffer layer between the Bismuth Layer-Structured Ferroelectrics (BLSF) and silicon substrate, were prepared n (100)-oriented silicon wafers by rf magnetron sputtering and metal-organic deposition methods. The c-axis-oriented Bi_2SiO_5 films obtained both deposition techniques. The carbon atoms were exists approximately 1-2 atom.% in the films by metal-organic deposition. On the other hand, the sputtered films were not include the carbon atoms, and have lower leakage current density of approximately 10~<11> A cm~2 and the interface trap density of 6x10~<12> cm~<-2> eV~<-1>. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Bismuth silicate / sputtering method / metal-organic deposition method / bismuth silicate/silicon structures / thin films |
Paper # | ED99-327,SDM99-220 |
Date of Issue |
Conference Information | |
Committee | SDM |
---|---|
Conference Date | 2000/3/9(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
---|---|
Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Preparation and Properties of Bi_2SiO_5/Si Structures |
Sub Title (in English) | |
Keyword(1) | Bismuth silicate |
Keyword(2) | sputtering method |
Keyword(3) | metal-organic deposition method |
Keyword(4) | bismuth silicate/silicon structures |
Keyword(5) | thin films |
1st Author's Name | Kouji Hiraki |
1st Author's Affiliation | Department of Electrical Engineering, Shibaura Institute of Technology() |
2nd Author's Name | Masaki Yamaguchi |
2nd Author's Affiliation | Department of Electrical Engineering, Shibaura Institute of Technology : Research Organization for Advanced Engineering, Shibaura Institute of Technology |
3rd Author's Name | Takao Nagatomo |
3rd Author's Affiliation | Department of Electrical Engineering, Shibaura Institute of Technology : Research Organization for Advanced Engineering, Shibaura Institute of Technology / |
4th Author's Name | Yoichiro Masuda |
4th Author's Affiliation | |
Date | 2000/3/9 |
Paper # | ED99-327,SDM99-220 |
Volume (vol) | vol.99 |
Number (no) | 673 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |