Presentation | 2000/3/8 Study of initial growth stage by "In-situ" monitoring growth of dielectric oxide : "In-situ" monitoring growth of TiO_2 thin films using laser Raman spectroscopy K. Morisawa, K. Nishida, S. Muraishi, A. Hiraki, T. Katoda, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | In-Situ |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | In-situ |
Paper # | ED99-319,SDM99-212 |
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Conference Information | |
Committee | SDM |
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Conference Date | 2000/3/8(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
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Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Study of initial growth stage by "In-situ" monitoring growth of dielectric oxide : "In-situ" monitoring growth of TiO_2 thin films using laser Raman spectroscopy |
Sub Title (in English) | |
Keyword(1) | In-situ |
1st Author's Name | K. Morisawa |
1st Author's Affiliation | Kochi University of Technology() |
2nd Author's Name | K. Nishida |
2nd Author's Affiliation | Kochi University of Technology |
3rd Author's Name | S. Muraishi |
3rd Author's Affiliation | Kochi University of Technology : JEOL Ltd. |
4th Author's Name | A. Hiraki |
4th Author's Affiliation | Kochi University of Technology |
5th Author's Name | T. Katoda |
5th Author's Affiliation | Kochi University of Technology |
Date | 2000/3/8 |
Paper # | ED99-319,SDM99-212 |
Volume (vol) | vol.99 |
Number (no) | 672 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |