| Presentation | 2000/1/21 High Temperature Sputtering Al-Plug Process with Ion-Implanted SOG Film H. Nishimura, K. Yamada, H. Mizuhara, K. Takegawa, Y. Inoue, K. Imai, A. Bando, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In this paper we present an example of high-temperature sputtering Al-Plug process. This technique is being followed with interest as a cost saving process. However, the more continuing to reduce the critical dimensions, SOG planarization process has disturbed the Al-Plug process.The main factor is the out gases from inter-layer SOG film. Therefore Al-plug process has been abandoned. Ion-implanted SOG film deters these gases. As a result, Al-plug process has put into practical use of 0.35 micron generation LSI process. Because Al-plug process can reuse by modifying a standard sputtering system, investment for equipment and utilities has been reduced. To use Al-plug process has made shorten the process flow. In addition, this process is an environment-friendly process because this technique does not use gases that contribute to global warming. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | high-temperature sputtering technique / Al-plug / ion-implantation / organic SOG / cost saving / environment-friendly |
| Paper # | SDM99-181 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2000/1/21(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | High Temperature Sputtering Al-Plug Process with Ion-Implanted SOG Film |
| Sub Title (in English) | |
| Keyword(1) | high-temperature sputtering technique |
| Keyword(2) | Al-plug |
| Keyword(3) | ion-implantation |
| Keyword(4) | organic SOG |
| Keyword(5) | cost saving |
| Keyword(6) | environment-friendly |
| 1st Author's Name | H. Nishimura |
| 1st Author's Affiliation | MOS-LSI Division, SANYO Electric Co., Ltd.() |
| 2nd Author's Name | K. Yamada |
| 2nd Author's Affiliation | MOS-LSI Division, SANYO Electric Co., Ltd. |
| 3rd Author's Name | H. Mizuhara |
| 3rd Author's Affiliation | Microelectronics Research Center, SANYO Electric Co., Ltd. |
| 4th Author's Name | K. Takegawa |
| 4th Author's Affiliation | MOS-LSI Division, SANYO Electric Co., Ltd. |
| 5th Author's Name | Y. Inoue |
| 5th Author's Affiliation | Microelectronics Research Center, SANYO Electric Co., Ltd. |
| 6th Author's Name | K. Imai |
| 6th Author's Affiliation | MOS-LSI Division, SANYO Electric Co., Ltd. |
| 7th Author's Name | A. Bando |
| 7th Author's Affiliation | Microelectronics Research Center, SANYO Electric Co., Ltd. |
| Date | 2000/1/21 |
| Paper # | SDM99-181 |
| Volume (vol) | vol.99 |
| Number (no) | 579 |
| Page | pp.pp.- |
| #Pages | 8 |
| Date of Issue | |