| Presentation | 1999/7/23 The Etching Behaviors of Pt/SrBi_2Ta_2O_9/NO/Si Structure for MFIS in NDRO-Type FRAM Won-Jae Lee, Chae-Ryung Cho, Shi-Ho Kim, In-Kyu You, Bo Woo Kim, Byoung-Gon Yu, Chang-Ho Shin, Hee-Chul Lee, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have investigated the etching properties of MFIS structure to fabricate Pt/SBT/NO/Si structure for the transistor gate in MFIS-FET. Etch rates of blanket platinum and SBT films and characterization of etched platinum structures using a patterned PECVD-SiO_2 mask on blanket platinum films were observed. Finally, we observed that etch rates of Pt and SBT and the etch profile were varied with various etch parameters. It was also investigated that the etching damage in SBT films during RIE process influenced on the electrical propelled of ferroelectric materials. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Pt electrode / SBT / etching / remanent polarization / etching profile |
| Paper # | SDM99-113 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1999/7/23(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | The Etching Behaviors of Pt/SrBi_2Ta_2O_9/NO/Si Structure for MFIS in NDRO-Type FRAM |
| Sub Title (in English) | |
| Keyword(1) | Pt electrode |
| Keyword(2) | SBT |
| Keyword(3) | etching |
| Keyword(4) | remanent polarization |
| Keyword(5) | etching profile |
| 1st Author's Name | Won-Jae Lee |
| 1st Author's Affiliation | Micro-Electronics Technology Laboratory, ETRI() |
| 2nd Author's Name | Chae-Ryung Cho |
| 2nd Author's Affiliation | Micro-Electronics Technology Laboratory, ETRI |
| 3rd Author's Name | Shi-Ho Kim |
| 3rd Author's Affiliation | Micro-Electronics Technology Laboratory, ETRI |
| 4th Author's Name | In-Kyu You |
| 4th Author's Affiliation | Micro-Electronics Technology Laboratory, ETRI |
| 5th Author's Name | Bo Woo Kim |
| 5th Author's Affiliation | Micro-Electronics Technology Laboratory, ETRI |
| 6th Author's Name | Byoung-Gon Yu |
| 6th Author's Affiliation | Micro-Electronics Technology Laboratory, ETRI |
| 7th Author's Name | Chang-Ho Shin |
| 7th Author's Affiliation | Korea Advanced Institute of Science and Technology (KAIST) |
| 8th Author's Name | Hee-Chul Lee |
| 8th Author's Affiliation | Korea Advanced Institute of Science and Technology (KAIST) |
| Date | 1999/7/23 |
| Paper # | SDM99-113 |
| Volume (vol) | vol.99 |
| Number (no) | 232 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |