| Presentation | 1999/7/23 Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition Sang Yeol Kang, Kook Hyun Choi, Seok Kiu Lee, Cheol Seong Hwang, Hyeong Joon Kim, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Ru thin films were deposited at 300℃～400℃ using RU(C_5H_4C_2H_5)_2 (Ru(EtCp)_2) as a precursor by low-pressure metal-organic chemical-vapor deposition (LP-MOCVD). The addition of O_2 gas is essential to form Ru thin films. The deposition rates of the films were about 200Å/min. At a lower oxygen addition and high substrate temperature, RUO_2 phases were formed. Thermodynamic calculation for Ru MOCVD were performed to explain the results of our experiments. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Ru thin film / High Dielectric thin films / MOCVD / DRAM capacitor |
| Paper # | SDM99-109 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1999/7/23(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition |
| Sub Title (in English) | |
| Keyword(1) | Ru thin film |
| Keyword(2) | High Dielectric thin films |
| Keyword(3) | MOCVD |
| Keyword(4) | DRAM capacitor |
| 1st Author's Name | Sang Yeol Kang |
| 1st Author's Affiliation | School of Materials Science and Engineering, Seoul National University() |
| 2nd Author's Name | Kook Hyun Choi |
| 2nd Author's Affiliation | School of Materials Science and Engineering, Seoul National University |
| 3rd Author's Name | Seok Kiu Lee |
| 3rd Author's Affiliation | School of Materials Science and Engineering, Seoul National University |
| 4th Author's Name | Cheol Seong Hwang |
| 4th Author's Affiliation | School of Materials Science and Engineering, Seoul National University |
| 5th Author's Name | Hyeong Joon Kim |
| 5th Author's Affiliation | School of Materials Science and Engineering, Seoul National University |
| Date | 1999/7/23 |
| Paper # | SDM99-109 |
| Volume (vol) | vol.99 |
| Number (no) | 232 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |