Presentation 1999/5/21
Maskless selective growth of GaN using low energy Ga-FIB and DMHy
D. H. Cho, M. Tanaka, K. Pak,
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Abstract(in English) Gallium nitride (GaN) is regarded as a promising material for near-ultraviolet optoelectronic devices since it has a large direct bandgap, 3.4 eV. We studied maskless selective growth of GaN on GaAs (100) substrate using Ga low energy focused ion beam (Ga-LEFIB) and dimethylhydrazine (DMHy) [(CH_3)_2N_2H_2] as Ga and N source, respectively. Ga-LEFIB with incident energy of 30 eV and DMHy were supplied simultaneously and GaN films were grown. In this experiment, We have found that under DMHy pressure of 6.0 x 10^<-6> Torr, a relatively pure GaN was formed when the substrate temperature was ~610 ℃. At relatively high substrate temperature (~650 ℃), nitridation of the growth films was significantly suppressed by N reevaporation and As incorporation from the GaAs substrate.
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Keyword(in English) GaN / Maskless selective growth / LEFIB / DMHy
Paper # SDM99-17
Date of Issue

Conference Information
Committee SDM
Conference Date 1999/5/21(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Maskless selective growth of GaN using low energy Ga-FIB and DMHy
Sub Title (in English)
Keyword(1) GaN
Keyword(2) Maskless selective growth
Keyword(3) LEFIB
Keyword(4) DMHy
1st Author's Name D. H. Cho
1st Author's Affiliation Department of Electric and Electronic Engineering Toyohashi University of Technology()
2nd Author's Name M. Tanaka
2nd Author's Affiliation Department of Electric and Electronic Engineering Toyohashi University of Technology
3rd Author's Name K. Pak
3rd Author's Affiliation Department of Electric and Electronic Engineering Toyohashi University of Technology
Date 1999/5/21
Paper # SDM99-17
Volume (vol) vol.99
Number (no) 68
Page pp.pp.-
#Pages 6
Date of Issue