Presentation 1994/11/25
Fabrication and Electrical Properties of Yttrium Silicide/Silicon
Yukinobu Tanida, Reiji Hatori, Junji Shirafuji,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Yttrium silicides have been fabricated both on Si(111)and on a- Si by the vacuum annealing.The relation of the annealing temperature with the silicide structure and with the electrical property is investigated.On Si(111),above the annealing temperature of 300℃,Yttrium disilicide(YSi_2-x>)grows and shows t he low Schottky barrier height with n-type silicon.However,above 400℃,the oxidization of silicide progresses and courses the increa se of barrier height and the reduction of the on-current.In the case of a-Si,the silicide grows above the 300℃,the junction anneal ed at 400℃ shows the best ohmic propertiy.
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Keyword(in English) Yttrium / Silicide / Schottky barrier / amorphous silicon / ohmic contact
Paper # SDM94-144
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Committee SDM
Conference Date 1994/11/25(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication and Electrical Properties of Yttrium Silicide/Silicon
Sub Title (in English)
Keyword(1) Yttrium
Keyword(2) Silicide
Keyword(3) Schottky barrier
Keyword(4) amorphous silicon
Keyword(5) ohmic contact
1st Author's Name Yukinobu Tanida
1st Author's Affiliation Department of Electrical Engineering,Faculty of Engineering,Osaka University()
2nd Author's Name Reiji Hatori
2nd Author's Affiliation Department of Electrical Engineering,Faculty of Engineering,Osaka University
3rd Author's Name Junji Shirafuji
3rd Author's Affiliation Department of Electrical Engineering,Faculty of Engineering,Osaka University
Date 1994/11/25
Paper # SDM94-144
Volume (vol) vol.94
Number (no) 367
Page pp.pp.-
#Pages 6
Date of Issue