| Presentation | 1994/10/19 ArF Excimer Laser Lithography using Top Surface Imaging Takeshi Ohfuji, Naoaki Aizaki, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Physical optics is applied to the study of scattering problems in a mask projection system of LSI lithography.Two main aspects through image calculation are considered.One is a rigorous alternative to calculate mask diffraction in the conventional Fourier optics.The other is to provide a ray tracing method instead of the commonly used partially coherent theory.A widely- used physical optics has been intended to provide scattering fields in the source side of a diffraction obstacle.Optical lithography requires knowledge of scattering fields in the shadow side of a mask in which the separation of apertures is in the same order as wave-length.We modify the integration surface of physical optics and add some new interpretations from the successive approximations which lead to a ray tracing model for apupil aperture in the optical projection system.The image calculation procedure is presented including phase and polarization variations. A numerical example shows a resolution improvement by using a coherent light source of finite size. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | physical optics / optical projection / mask diffraction / vector image / lithography |
| Paper # | SDM94-107 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1994/10/19(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | ArF Excimer Laser Lithography using Top Surface Imaging |
| Sub Title (in English) | |
| Keyword(1) | physical optics |
| Keyword(2) | optical projection |
| Keyword(3) | mask diffraction |
| Keyword(4) | vector image |
| Keyword(5) | lithography |
| 1st Author's Name | Takeshi Ohfuji |
| 1st Author's Affiliation | NEC Corp.() |
| 2nd Author's Name | Naoaki Aizaki |
| 2nd Author's Affiliation | NEC Corp. |
| Date | 1994/10/19 |
| Paper # | SDM94-107 |
| Volume (vol) | vol.94 |
| Number (no) | 282 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |