| Presentation | 1994/7/25 0.25μm Buried-Channel PMOSFET′s Using Channel Doping Through Amor phous Si Thin Film Hiroshi Ishida, Akihiro Shimizu, Nagatoshi Ohki, Toshiaki Yamanaka, Takahiro Nagano, |
|---|---|
| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | A novel channel doping through an amorphous Si thin film to form a shallow buried-channel layer for 0.25μm pMOSFETs is investigated .Good controlability of threshold voltage,low threshold voltage roll-off,and improvement in the TDDB characteristics are obtained. This is because this process suppresses boron redistribution which occurs during gate oxidation in a conventional process. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | p^+ polysilicon gate / boron-doped polysilicon / nitrogen-doped polysilicon |
| Paper # | SDM94-43 |
| Date of Issue |
| Conference Information | |
| Committee | SDM |
|---|---|
| Conference Date | 1994/7/25(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | 0.25μm Buried-Channel PMOSFET′s Using Channel Doping Through Amor phous Si Thin Film |
| Sub Title (in English) | |
| Keyword(1) | p^+ polysilicon gate |
| Keyword(2) | boron-doped polysilicon |
| Keyword(3) | nitrogen-doped polysilicon |
| 1st Author's Name | Hiroshi Ishida |
| 1st Author's Affiliation | Hitachi ULSI Engineering Corporation() |
| 2nd Author's Name | Akihiro Shimizu |
| 2nd Author's Affiliation | Hitachi ULSI Engineering Corporation |
| 3rd Author's Name | Nagatoshi Ohki |
| 3rd Author's Affiliation | Hitachi ULSI Engineering Corporation |
| 4th Author's Name | Toshiaki Yamanaka |
| 4th Author's Affiliation | Central Research Laboratory Hitachi Ltd. |
| 5th Author's Name | Takahiro Nagano |
| 5th Author's Affiliation | Central Research Laboratory Hitachi Ltd. |
| Date | 1994/7/25 |
| Paper # | SDM94-43 |
| Volume (vol) | vol.94 |
| Number (no) | 180 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |