| Presentation | 1998/8/20 Interaction between NF_3 and Si substrate : A Density Functional Study Akira Endou, Aruba Yamada, S.Salai C. Ammal, Momoji Kubo, Kazuo Teraishi, Akira Miyamoto, Masahiro Kitajima, Thomas W. Little, Fumio S. Ohuchi, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | As a first step to understand the etching process of the Si substrate by NF_3, we carried out density functional quantum chemical calculations to investigate the interaction between NF_3 molecule and the silicon surface. The adsorption states of NF_x (x=1, 2) species and F atom on Si surface and the incorporated states of F atom at the interstitial sites of silicon lattice were studied. As a result, it was found that F atom can not be incorporated at the interstitial sites in the ground state. From experimental data, it is suggested that the change on F atom is relatively close to the neutral state. Our result showed that the negative charge on F atom in Si-N-F moiety was considerable small, which may correspond to experimental findings. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Density functional quantum chemical calculation / Si etching process |
| Paper # | SDM98-119 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1998/8/20(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Interaction between NF_3 and Si substrate : A Density Functional Study |
| Sub Title (in English) | |
| Keyword(1) | Density functional quantum chemical calculation |
| Keyword(2) | Si etching process |
| 1st Author's Name | Akira Endou |
| 1st Author's Affiliation | Graduate School of Engineering, Tohoku University() |
| 2nd Author's Name | Aruba Yamada |
| 2nd Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 3rd Author's Name | S.Salai C. Ammal |
| 3rd Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 4th Author's Name | Momoji Kubo |
| 4th Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 5th Author's Name | Kazuo Teraishi |
| 5th Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 6th Author's Name | Akira Miyamoto |
| 6th Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 7th Author's Name | Masahiro Kitajima |
| 7th Author's Affiliation | National Research Institute for Metals |
| 8th Author's Name | Thomas W. Little |
| 8th Author's Affiliation | University of Washington |
| 9th Author's Name | Fumio S. Ohuchi |
| 9th Author's Affiliation | University of Washington |
| Date | 1998/8/20 |
| Paper # | SDM98-119 |
| Volume (vol) | vol.98 |
| Number (no) | 242 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |