Presentation 1998/12/10
Determination of Trap Densities and Energy Levels in a Thin BST Film on Si by Discharge Current Transient Spectroscopy
Takashi Hase, Hideharu Matsuura,
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Abstract(in English) In FET-type nonvolatile memories with MFS(metal-ferroelectric-semiconductor)structure, it is pointed out that data retention time becomes short due to charged carrier injection into the ferroelectric layer. In order to solve this problem, MDFDS(M-dielectric-F-dielectric-S)structure is proposed. In this strucure, two dielectric layers prevent the injection. In order to obtain high resistive BST(Ba_xSr_1-xTiO_3)layers with a high dielectric constant, the relationship between traps and a leakage current in the layer was investigated. The densities and energy levels of traps in BST were determined by DCTS(discharge current transient spectroscopy), and traps with the trap levels of around 1.14 eV were found to affect the leakage current. Moreover, the relationship between DCTS signals and the position of traps in the film was discussed, since it had not been discussed in the previous papers.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) ferroelectric / nonvolatile memory / BST / traps / leakage current / discharge current transient spectroscopy(DCTS)
Paper # SDM98-180
Date of Issue

Conference Information
Committee SDM
Conference Date 1998/12/10(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Determination of Trap Densities and Energy Levels in a Thin BST Film on Si by Discharge Current Transient Spectroscopy
Sub Title (in English)
Keyword(1) ferroelectric
Keyword(2) nonvolatile memory
Keyword(3) BST
Keyword(4) traps
Keyword(5) leakage current
Keyword(6) discharge current transient spectroscopy(DCTS)
1st Author's Name Takashi Hase
1st Author's Affiliation Department of Electronics, Osaka Electro-Communication University()
2nd Author's Name Hideharu Matsuura
2nd Author's Affiliation Department of Electronics, Osaka Electro-Communication University
Date 1998/12/10
Paper # SDM98-180
Volume (vol) vol.98
Number (no) 445
Page pp.pp.-
#Pages 8
Date of Issue