Presentation 1993/4/22
Experimental evidence for Lognormal distribution of the capture cross-section of hole traps in MOS structure
D.M.Khosru Quazi, Kenji Taniguchi, Chihiro Hamaguchi,
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Abstract(in English) Substrate hot-hole injection experiments have been carried out using pMOS transistors with very thin gate oxides to investigate hole trapping phenomena in the oxide.A charge centroid at a distance of 3.2 nm from the Si, SiO_2 interface is found to describe the oxide thickness dependence of threshold voltage shift in a successful manner for the range used in this study(t_ox>=4.6 to 15nm).Capture cross-section of oxide hole traps is found to have distributed values between 10^-15> and 10^-13>cm^2 and can well be described by a Lognormal distribution function with a mean value of 0.7×10^-14> cm^2.With this distribution of capture cross -section,we proposed a model for trapped holes in the oxide which showed excellent agreement with the experimental data.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) pMOS transistor / hole trap / charge centroid / capture cross- section / Lognormal distribution
Paper # SDM93-8
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Committee SDM
Conference Date 1993/4/22(1days)
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Registration To Silicon Device and Materials (SDM)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Experimental evidence for Lognormal distribution of the capture cross-section of hole traps in MOS structure
Sub Title (in English)
Keyword(1) pMOS transistor
Keyword(2) hole trap
Keyword(3) charge centroid
Keyword(4) capture cross- section
Keyword(5) Lognormal distribution
1st Author's Name D.M.Khosru Quazi
1st Author's Affiliation Faculty of Engineering,Osaka University()
2nd Author's Name Kenji Taniguchi
2nd Author's Affiliation Faculty of Engineering,Osaka University
3rd Author's Name Chihiro Hamaguchi
3rd Author's Affiliation Faculty of Engineering,Osaka University
Date 1993/4/22
Paper # SDM93-8
Volume (vol) vol.93
Number (no) 7
Page pp.pp.-
#Pages 8
Date of Issue