Presentation 1993/4/22
Low-temperature Si epitaxial growth on HF-treated substrates and evaluation of epitaxial layer/Si substrate interface.
Akihiro Miyauchi, Yousuke Inoue, Katsuhisa Usami, Takaya Suzuki,
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Abstract(in English) Low-temperature Si epitaxial growth on HF-treated Si substrates were investigated.The condition of HF treatment for the epitaxial growth with lowest stacking fault density was dipping in the 5%HF solution without ultra-pure water rinse.Epitaxial growth above 580℃ were achieved under higher growth temperature and lower H_2O concentration in the reaction gases.Low-temperature (500-550℃) epi taxial growth films were obtained under low H_2O partial pressure in the growth ambient. It was observed that there were discrete contaminated areas with 1.4 nm thickness at the interface between epitaxial layer and Si substrate.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Silicon / epitaxial growth / HF-treatment / interface / oxidation / low pressure growth
Paper # SDM93-4
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Committee SDM
Conference Date 1993/4/22(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Low-temperature Si epitaxial growth on HF-treated substrates and evaluation of epitaxial layer/Si substrate interface.
Sub Title (in English)
Keyword(1) Silicon
Keyword(2) epitaxial growth
Keyword(3) HF-treatment
Keyword(4) interface
Keyword(5) oxidation
Keyword(6) low pressure growth
1st Author's Name Akihiro Miyauchi
1st Author's Affiliation Hitachi Research Laboratory,Hitachi Ltd.()
2nd Author's Name Yousuke Inoue
2nd Author's Affiliation Hitachi Research Laboratory,Hitachi Ltd.
3rd Author's Name Katsuhisa Usami
3rd Author's Affiliation Hitachi Research Laboratory,Hitachi Ltd.
4th Author's Name Takaya Suzuki
4th Author's Affiliation Hitachi Research Laboratory,Hitachi Ltd.
Date 1993/4/22
Paper # SDM93-4
Volume (vol) vol.93
Number (no) 7
Page pp.pp.-
#Pages 6
Date of Issue