Presentation 1993/4/22
Static charge removal with IPA solution : Static charge prevention in wet chemical process
Seiji Sudoh, Hitoshi Morinaga, Tadahiro Ohmi, Hiroyuki Mishima,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Achieving a clean manufacturing environment,static charge is one of the most important factor.Electrostatic discharge causes device destruction and circuit disconnection,additionally the problem of floating particle adhesion.In order to eliminate static charge build up in wet chemical processes,the IPA vapor drying method is the most effective.Using quantitative method for the direct measurement of static charge,the mechanism of static charge removal by IPA solution was studied.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) static charge / IPA / IPA solution / wet chemical process / particle adhesion / IPA vaper dryer
Paper # SDM93-3
Date of Issue

Conference Information
Committee SDM
Conference Date 1993/4/22(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Static charge removal with IPA solution : Static charge prevention in wet chemical process
Sub Title (in English)
Keyword(1) static charge
Keyword(2) IPA
Keyword(3) IPA solution
Keyword(4) wet chemical process
Keyword(5) particle adhesion
Keyword(6) IPA vaper dryer
1st Author's Name Seiji Sudoh
1st Author's Affiliation Department of Electronics,Faculty of Engineering,Tohoku University()
2nd Author's Name Hitoshi Morinaga
2nd Author's Affiliation Department of Electronics,Faculty of Engineering,Tohoku University
3rd Author's Name Tadahiro Ohmi
3rd Author's Affiliation Department of Electronics,Faculty of Engineering,Tohoku University
4th Author's Name Hiroyuki Mishima
4th Author's Affiliation Tokuyama Soda
Date 1993/4/22
Paper # SDM93-3
Volume (vol) vol.93
Number (no) 7
Page pp.pp.-
#Pages 8
Date of Issue