| Presentation | 1993/4/22 Prevention effect of microroughness on Si wafer surface in buffered hydrogen fluoride by surfactant addition Mitsuo Miyamoto, Naohide Kita, Shoichi Ishida, Toshio Tatsuno, |
|---|---|
| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | It was realized that the generation of microroughness on Si wafer surface in buffered hydrogen fluoride(BHF) was prevented by several 10 ppm order addition of surfactant.It was founded that the suppression effect of microroughness was observed by 50 ppm surfactant addition.It was confirmed that the suppression effect of microroughness on Si wafer surface in BHF contained surfactant is owing to suppressing the dissolution of Si into BHF from Si wafer,and the microroughness was also suppressed by lowering NH_4F concentration in BHF.Moreover,the relation between the etching rate of various Si oxide filmes by conventional BHF and NH_4F concentration in BHF was investigated. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Buffered hydrogen fluoride / Surfactant / Si wafer / Microroughness / Etching |
| Paper # | SDM93-2 |
| Date of Issue |
| Conference Information | |
| Committee | SDM |
|---|---|
| Conference Date | 1993/4/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Prevention effect of microroughness on Si wafer surface in buffered hydrogen fluoride by surfactant addition |
| Sub Title (in English) | |
| Keyword(1) | Buffered hydrogen fluoride |
| Keyword(2) | Surfactant |
| Keyword(3) | Si wafer |
| Keyword(4) | Microroughness |
| Keyword(5) | Etching |
| 1st Author's Name | Mitsuo Miyamoto |
| 1st Author's Affiliation | Morita Chemical Industries() |
| 2nd Author's Name | Naohide Kita |
| 2nd Author's Affiliation | Morita Chemical Industries |
| 3rd Author's Name | Shoichi Ishida |
| 3rd Author's Affiliation | Morita Chemical Industries |
| 4th Author's Name | Toshio Tatsuno |
| 4th Author's Affiliation | Morita Chemical Industries |
| Date | 1993/4/22 |
| Paper # | SDM93-2 |
| Volume (vol) | vol.93 |
| Number (no) | 7 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |