| Presentation | 1993/4/22 Organic Removal from Si Wafer Surface Using Ozonized Ultrapure Water Shinichi Yasui, Tadahiro Ohmi, Takashi Futatsuki, Naomichi Yonekawa, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | The RCA cleaning method employs H_2SO_4, H_2O_2 cleaning(SPM) to remove organic molecules.Since SPM uses chemicals and requires high temperature,however it causes problems in terms of chemical waste processing and handling.On the hand,the ozonized ultrapure water cleaning is performed at room temperature and its O_3 concentration is low.This means this method does not require chemical waste processing.Introduction of the ozonized ultrapurewater cleaning to organic material removal process will make it possible to improve handling and to realize a closed system of chemical waste processing as well as to lower process temperature in the cleaning process. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Ozone / Organic Material / Si Wafer / Surfactant / Roughness / Cleaning |
| Paper # | SDM93-1 |
| Date of Issue |
| Conference Information | |
| Committee | SDM |
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| Conference Date | 1993/4/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Organic Removal from Si Wafer Surface Using Ozonized Ultrapure Water |
| Sub Title (in English) | |
| Keyword(1) | Ozone |
| Keyword(2) | Organic Material |
| Keyword(3) | Si Wafer |
| Keyword(4) | Surfactant |
| Keyword(5) | Roughness |
| Keyword(6) | Cleaning |
| 1st Author's Name | Shinichi Yasui |
| 1st Author's Affiliation | Department of Electronics Faculty of Engineering,Tohoku University() |
| 2nd Author's Name | Tadahiro Ohmi |
| 2nd Author's Affiliation | Department of Electronics Faculty of Engineering,Tohoku University |
| 3rd Author's Name | Takashi Futatsuki |
| 3rd Author's Affiliation | Department of Electronics Faculty of Engineering,Tohoku University |
| 4th Author's Name | Naomichi Yonekawa |
| 4th Author's Affiliation | Department of Electronics Faculty of Engineering,Tohoku University |
| Date | 1993/4/22 |
| Paper # | SDM93-1 |
| Volume (vol) | vol.93 |
| Number (no) | 7 |
| Page | pp.pp.- |
| #Pages | 8 |
| Date of Issue | |