| Presentation | 1993/8/24 pH Controlled chemical mechanical polishing for ultra thin bonded SOI wafers Fumitoshi Sugimoto, Hiroshi Horie, Yoshihiro Arimoto, Takashi Ito, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | A pH-cntrolled chemical mechanical polishing method has been developed for a large-area ultra-thin SOI layers with uniform thickness.Using a polishing reagent with both pH and the colloidal silica concentration lowered,as well as grooves fabricated on the SOI layer to expose the insulator oxide,polishing rate clearly dropped leaving a 0.1-μm-thick SOI layer.It is thought that the lo wer local pH of the reagent,caused by contact between the reagent and the insulator oxide,reduced the colloidal silica activity nearby the groove. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | polishing / colloidalsilica / pH / SOI |
| Paper # | SDM93-84 |
| Date of Issue |
| Conference Information | |
| Committee | SDM |
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| Conference Date | 1993/8/24(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | pH Controlled chemical mechanical polishing for ultra thin bonded SOI wafers |
| Sub Title (in English) | |
| Keyword(1) | polishing |
| Keyword(2) | colloidalsilica |
| Keyword(3) | pH |
| Keyword(4) | SOI |
| 1st Author's Name | Fumitoshi Sugimoto |
| 1st Author's Affiliation | ULSI Technology Laboratory,Fujitsu Laboratories Ltd.() |
| 2nd Author's Name | Hiroshi Horie |
| 2nd Author's Affiliation | ULSI Technology Laboratory,Fujitsu Laboratories Ltd. |
| 3rd Author's Name | Yoshihiro Arimoto |
| 3rd Author's Affiliation | ULSI Technology Laboratory,Fujitsu Laboratories Ltd. |
| 4th Author's Name | Takashi Ito |
| 4th Author's Affiliation | ULSI Technology Laboratory,Fujitsu Laboratories Ltd. |
| Date | 1993/8/24 |
| Paper # | SDM93-84 |
| Volume (vol) | vol.93 |
| Number (no) | 192 |
| Page | pp.pp.- |
| #Pages | 7 |
| Date of Issue | |