Presentation 1993/8/24
Charge-up measurements during ashing process
Motoki Kobayashi, Takayuki Matsui, Jun Kanamori,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) A sensitive method for measuring the charge-up damage during ashing process was studied.We found out MNOS capacitor and Surface Charge Analyzer(SCA)are useful for measuring the small amount of charge which does not breakdown 10nm gate oxide of MOS capacitor. And the charge stored in gate electrode of MNOS capacitor and on oxide surface of SCA decrease as ashing time increases with barrel ashing system.N_2 annealing reduces the charge-up damage gradually, while ashing treatment reduces it rapidly.It is considered that reduction of the charge-up damage during ashing treatment is not caused by only thermal recovering.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) ashing / charge-up / Breakdown / MOS / MNOS / SCA
Paper # SDM93-83
Date of Issue

Conference Information
Committee SDM
Conference Date 1993/8/24(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Charge-up measurements during ashing process
Sub Title (in English)
Keyword(1) ashing
Keyword(2) charge-up
Keyword(3) Breakdown
Keyword(4) MOS
Keyword(5) MNOS
Keyword(6) SCA
1st Author's Name Motoki Kobayashi
1st Author's Affiliation Oki Electric Industry()
2nd Author's Name Takayuki Matsui
2nd Author's Affiliation Oki Electric Industry
3rd Author's Name Jun Kanamori
3rd Author's Affiliation Oki Electric Industry
Date 1993/8/24
Paper # SDM93-83
Volume (vol) vol.93
Number (no) 192
Page pp.pp.-
#Pages 6
Date of Issue