Presentation 1993/7/26
The dielectric breakdown characteristics of thin gate oxide prepared by trans 1,2 dichloroethylene added oxidation
Kenji Yoneda, Kenji Hagiwara, Hiroshi Ohishi, Yoshihiro Todokoro,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) The dielectric breakdown characteristics of thin gate oxide prepared by Trans1,2-Dichloroethylene(t-DCE)added oxidation as a substitution of 1-1-1 Trichloroethane(1-1-1 TCA)have been investigated.The t-DCE has lower ozone depletion potential(ODP=0. 0001)than the 1-1-1 TCA(ODP=0.1)and easy to replace the 1-1-1 TCA. The breakdown reliability was improved by adding.the t-DCE and the optimum.concentration was 5wt% for SC-1 pre-clean with DHF.The high quality oxide can be successfully formed by t-DCE added oxidation with minimizing the influence to ozone layer.The t-DCE is a primary candidate to replace the 1-1-1 TCA.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Trans 1,2 dichloroethylene / TDDB / Dielectric breakdown / Gate oxide
Paper # SDM93-71
Date of Issue

Conference Information
Committee SDM
Conference Date 1993/7/26(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) The dielectric breakdown characteristics of thin gate oxide prepared by trans 1,2 dichloroethylene added oxidation
Sub Title (in English)
Keyword(1) Trans 1,2 dichloroethylene
Keyword(2) TDDB
Keyword(3) Dielectric breakdown
Keyword(4) Gate oxide
1st Author's Name Kenji Yoneda
1st Author's Affiliation Matsushita Electronics Corporation()
2nd Author's Name Kenji Hagiwara
2nd Author's Affiliation Matsushita Electronics Corporation
3rd Author's Name Hiroshi Ohishi
3rd Author's Affiliation Matsushita Electronics Corporation
4th Author's Name Yoshihiro Todokoro
4th Author's Affiliation Matsushita Electronics Corporation
Date 1993/7/26
Paper # SDM93-71
Volume (vol) vol.93
Number (no) 172
Page pp.pp.-
#Pages 7
Date of Issue