| Presentation | 1993/7/26 Gettering by carbon ion implantation Toshio Ando, Seiichi Isomae, Kaori Kondo, Yuuji Sugino, Masao Tamura, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Iron gettering behavior in ″low-energy″ carbon ion implantation was evaluated by ac surface photovoltage measurement.Iron concentration in silicon substrate was reduced from 3.5×10^13>cm^ -3> to 1.0×10^13>cm^-3> by carbon implantation with energy of 6 0 keV and dose of 1×10^15>cm^-2>.Lower dosage((]SY.ltoreq.(]×1 0^13>cm^-2>),however,did not getter iron contaminants effectively.Carbon atoms implanted near the silicon surface did not significantly increase defects causing the dielectric break- down of the oxide layer grown on the substrate. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | ion-implantation / gettering / carbon / iron / p-n junction / gate oxide |
| Paper # | SDM93-70 |
| Date of Issue |
| Conference Information | |
| Committee | SDM |
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| Conference Date | 1993/7/26(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Gettering by carbon ion implantation |
| Sub Title (in English) | |
| Keyword(1) | ion-implantation |
| Keyword(2) | gettering |
| Keyword(3) | carbon |
| Keyword(4) | iron |
| Keyword(5) | p-n junction |
| Keyword(6) | gate oxide |
| 1st Author's Name | Toshio Ando |
| 1st Author's Affiliation | Device Development Center,Hitachi,Ltd.,() |
| 2nd Author's Name | Seiichi Isomae |
| 2nd Author's Affiliation | Central Research Laboratory,Hitachi,Ltd., |
| 3rd Author's Name | Kaori Kondo |
| 3rd Author's Affiliation | Device Development Center,Hitachi,Ltd., |
| 4th Author's Name | Yuuji Sugino |
| 4th Author's Affiliation | Kofu Manufacturing Operation,Hitachi,Ltd., |
| 5th Author's Name | Masao Tamura |
| 5th Author's Affiliation | Optoelectronics Technology Research Laboratory |
| Date | 1993/7/26 |
| Paper # | SDM93-70 |
| Volume (vol) | vol.93 |
| Number (no) | 172 |
| Page | pp.pp.- |
| #Pages | 8 |
| Date of Issue | |