Presentation 1993/7/26
Analysis of Mobility-Transconductance Enhancement in Double-Gate MOSFET
Hiroshi Inokawa, Tetsushi Sakai,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have fabricated novel double-gate MOSFETS,in which silicon layer thickness can be varied within a single wafer while keeping other device parameters such as channel width,impurity concentration,etc.constant.Using these devices,we found that,as the result of full depletion of the silicon layer,saturation- region transconductance increases by 88 %,98 % and 66 % for(100)n- channel,(111)n-channel and(100)p-channel,respectively.Analysis in terms of reduced body effect and increased mobility showed that the contribution of reduced body effect to the increased transconductance can be explained,but the observed increase in mobility was not compatible with the reported μ_eff>-E_eff> rela tionships.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) double-gate MOSFET / full depletion / mobility / transconductance
Paper # SDM93-67
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Conference Information
Committee SDM
Conference Date 1993/7/26(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Analysis of Mobility-Transconductance Enhancement in Double-Gate MOSFET
Sub Title (in English)
Keyword(1) double-gate MOSFET
Keyword(2) full depletion
Keyword(3) mobility
Keyword(4) transconductance
1st Author's Name Hiroshi Inokawa
1st Author's Affiliation NTT LSI Laboratories()
2nd Author's Name Tetsushi Sakai
2nd Author's Affiliation NTT LSI Laboratories
Date 1993/7/26
Paper # SDM93-67
Volume (vol) vol.93
Number (no) 172
Page pp.pp.-
#Pages 6
Date of Issue