| Presentation | 1993/7/26 HOT CARRIER RESISTANCE OF VERY-THIN GATE OXIDE FORMED BY ULTRACLEAN OXIDATION Kou Nakamura, Kohji Makihara, Mizuho Morita, Tadahiro Ohmi, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | The effect of oxidation environment on the reliability of very- thin oxides is clarified by comparing ultraclean dry oxides,formed in the environment characterized by extremely low moisture and metal impurity concentrations,and conventional dry oxides.The ultraclean oxide has high reliability against the generation of electron traps,hole traps and interface traps by hot electrons injection or voltage stress.It is believed that the number of Si- OH bonds in the oxide film is reduced due to the low moisture concentration in oxidation furnace and consequently the water- related trap density is decreased. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | ultraclean oxide / reliability / hot carrier / electron trap / hole trap / interface trap |
| Paper # | SDM93-63 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1993/7/26(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | HOT CARRIER RESISTANCE OF VERY-THIN GATE OXIDE FORMED BY ULTRACLEAN OXIDATION |
| Sub Title (in English) | |
| Keyword(1) | ultraclean oxide |
| Keyword(2) | reliability |
| Keyword(3) | hot carrier |
| Keyword(4) | electron trap |
| Keyword(5) | hole trap |
| Keyword(6) | interface trap |
| 1st Author's Name | Kou Nakamura |
| 1st Author's Affiliation | Department of Electronics,Faculty of Engineering,Tohoku University() |
| 2nd Author's Name | Kohji Makihara |
| 2nd Author's Affiliation | Department of Electronics,Faculty of Engineering,Tohoku University |
| 3rd Author's Name | Mizuho Morita |
| 3rd Author's Affiliation | Laboratory for Microelectronics Research Institute of Electrical Communication,Tohoku University |
| 4th Author's Name | Tadahiro Ohmi |
| 4th Author's Affiliation | Department of Electronics,Faculty of Engineering,Tohoku University |
| Date | 1993/7/26 |
| Paper # | SDM93-63 |
| Volume (vol) | vol.93 |
| Number (no) | 172 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |