| Presentation | 1993/7/26 Enhanced liquid phase deposition SiO_2 films by electric field Kenji Fukumitsu, Nobuo Haneji, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | The liquid phase deposition(LPD)is the method to deposit SiO_2 films on the substrate dipped in the super-saturated H_2SiF_6 solutions.The LPD is room temperature process,and attractive for the low-temperature process of the semiconductor device.However, there are still some disadvantages in LPD SiO_2 films,such as the breakdown field and its low deposition rate(about several tens£nm, h!),and so on. We studied the role of the electric field to the LPD process,and got the good results as to the deposition rate(about 2 times faster than the normal LPD process)and the uniformity of the films. But characteristics of the SiO_2, Si interface was not improved.So it is necessary to adjust the parameters during the deposition for improvement of characteristics. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | liquid phase deposition / low temperature process / break down voltage |
| Paper # | SDM93-57 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1993/7/26(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Enhanced liquid phase deposition SiO_2 films by electric field |
| Sub Title (in English) | |
| Keyword(1) | liquid phase deposition |
| Keyword(2) | low temperature process |
| Keyword(3) | break down voltage |
| 1st Author's Name | Kenji Fukumitsu |
| 1st Author's Affiliation | Department of Electrical Engineering,Faculty of Engineering, Yokohama National University() |
| 2nd Author's Name | Nobuo Haneji |
| 2nd Author's Affiliation | Department of Electrical Engineering,Faculty of Engineering, Yokohama National University |
| Date | 1993/7/26 |
| Paper # | SDM93-57 |
| Volume (vol) | vol.93 |
| Number (no) | 172 |
| Page | pp.pp.- |
| #Pages | 7 |
| Date of Issue | |