| Presentation | 1995/10/20 Preperation of silicon oxynitride thin films by remote-plasma excited nitrogen and oxygen Yoji Saito, Nobuhiro Kawabe, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Silicon oxynitride thin films are promising highly-reliable dielectrics in the memory devices. In this study, direct oxynitridation of silicon is successfully performed by remote-plasma excited nitrogen and oxygen gaseous mixtures at 550 ℃. Nitrogen atoms are mainly incorporated near the SiO_2-Si interfaces with Auger electron spectroscopy measurements. We have controled the peak density of nitrogen up to several atomic percents at least, varying the partial pressure of nitrogen and oxygen. The supply of active oxygen species is required for the growth of oxynitride films, but reduces the density of nitrogen in the films. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | remote plasma / silicon oxynitride films / nitrogen gas / oxygen gas / Auger analysis / gas analysis |
| Paper # | SDM95-151 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1995/10/20(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Preperation of silicon oxynitride thin films by remote-plasma excited nitrogen and oxygen |
| Sub Title (in English) | |
| Keyword(1) | remote plasma |
| Keyword(2) | silicon oxynitride films |
| Keyword(3) | nitrogen gas |
| Keyword(4) | oxygen gas |
| Keyword(5) | Auger analysis |
| Keyword(6) | gas analysis |
| 1st Author's Name | Yoji Saito |
| 1st Author's Affiliation | Department of Electric Engineering and Electronics, Faculty of Engineering, Seikei University() |
| 2nd Author's Name | Nobuhiro Kawabe |
| 2nd Author's Affiliation | Department of Electric Engineering and Electronics, Faculty of Engineering, Seikei University |
| Date | 1995/10/20 |
| Paper # | SDM95-151 |
| Volume (vol) | vol.95 |
| Number (no) | 317 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |