| Presentation | 1995/10/20 Transformation of a Refractive Metal Surface by Via Hole Etching and Its Influence on Contact Resistance Shoji Sudo, Yoshinari Ichihashi, Norihiro Ikeda, Kaoru Taketa, Kazunobu Mameno, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have revealed for the first time that a TiOx/TiFx mixed layer formed by a via hole etching process causes high contact resistance in the case of a Ti/Al structure for the lst metal, and that this phenomenon is not observed for a TiN/Al structure. The Ti surface changes into a TiOx/TiFx/TiCx mixed layer by C-F plasma exposure. Subsequently, the O_2 plasma in the resist removal process replaces C atoms with 0 or F atoms. Moreover, the TiOx/TiFx layer can be easily removed by conventional Ar sputter etching and, as a result, the via contact resistance is successfully reduced. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Etching / Anti-Reflective-Cap / via hole / contact resistance |
| Paper # | SDM95-149 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1995/10/20(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Transformation of a Refractive Metal Surface by Via Hole Etching and Its Influence on Contact Resistance |
| Sub Title (in English) | |
| Keyword(1) | Etching |
| Keyword(2) | Anti-Reflective-Cap |
| Keyword(3) | via hole |
| Keyword(4) | contact resistance |
| 1st Author's Name | Shoji Sudo |
| 1st Author's Affiliation | Microelectronics Research Center, SANYO Electric Co., Ltd.() |
| 2nd Author's Name | Yoshinari Ichihashi |
| 2nd Author's Affiliation | Microelectronics Research Center, SANYO Electric Co., Ltd. |
| 3rd Author's Name | Norihiro Ikeda |
| 3rd Author's Affiliation | Microelectronics Research Center, SANYO Electric Co., Ltd. |
| 4th Author's Name | Kaoru Taketa |
| 4th Author's Affiliation | Microelectronics Research Center, SANYO Electric Co., Ltd. |
| 5th Author's Name | Kazunobu Mameno |
| 5th Author's Affiliation | Microelectronics Research Center, SANYO Electric Co., Ltd. |
| Date | 1995/10/20 |
| Paper # | SDM95-149 |
| Volume (vol) | vol.95 |
| Number (no) | 317 |
| Page | pp.pp.- |
| #Pages | 8 |
| Date of Issue | |