| Presentation | 1995/8/16 Coulomb Interation Effect in Cell Projection Lithography Hiroshi Yamashita, Katuyuki Itoh, Kenichi Tokunaga, Takao Tamura, Hiroshi Nozue, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have experimentally analyzed the resolution in e-beam cell projection lithography. The results indicated that the Coulomb interaction effect and the proximity effect are critical issues for resolution because of the larger beam current compared with the conventional variable-shaped beam. We achieved a practical resolution of 0.18μm, which is enough for 1G DRAM fabrication, by adjusting the beam current. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | electrom beam lithography / cell projection / Coulomb interaction effect / resolution / DRAM |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1995/8/16(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Coulomb Interation Effect in Cell Projection Lithography |
| Sub Title (in English) | |
| Keyword(1) | electrom beam lithography |
| Keyword(2) | cell projection |
| Keyword(3) | Coulomb interaction effect |
| Keyword(4) | resolution |
| Keyword(5) | DRAM |
| 1st Author's Name | Hiroshi Yamashita |
| 1st Author's Affiliation | ULSI Device Development Laboratories, NEC Corporation() |
| 2nd Author's Name | Katuyuki Itoh |
| 2nd Author's Affiliation | ULSI Device Development Laboratories, NEC Corporation |
| 3rd Author's Name | Kenichi Tokunaga |
| 3rd Author's Affiliation | ULSI Device Development Laboratories, NEC Corporation |
| 4th Author's Name | Takao Tamura |
| 4th Author's Affiliation | ULSI Device Development Laboratories, NEC Corporation |
| 5th Author's Name | Hiroshi Nozue |
| 5th Author's Affiliation | ULSI Device Development Laboratories, NEC Corporation |
| Date | 1995/8/16 |
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| Volume (vol) | vol.95 |
| Number (no) | 205 |
| Page | pp.pp.- |
| #Pages | 8 |
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