Presentation | 1995/7/27 Inversion Layer Mobility of Subhalf-micron MOS Transistors Duheon Song, Jongsung Park, Kyungho Lee, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We present the inversion layer mobility of a subhalf-micron MOS transistor, which is extracted from I-V measurements and the inversion charge based on the unified charge control model. It is shown that universality on the inversion layer mobility of a subhalf micron MOSFET is still valid, and the inversion layer mobility of short channel MOSFETs is very sensitive to the variations of series resistances. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | inversion layer mobility / unified charge control model / universality law |
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Committee | SDM |
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Conference Date | 1995/7/27(1days) |
Place (in Japanese) | (See Japanese page) |
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Registration To | Silicon Device and Materials (SDM) |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Inversion Layer Mobility of Subhalf-micron MOS Transistors |
Sub Title (in English) | |
Keyword(1) | inversion layer mobility |
Keyword(2) | unified charge control model |
Keyword(3) | universality law |
1st Author's Name | Duheon Song |
1st Author's Affiliation | Advanced Device Development Dept., ULSI Research Lab., LG Semicon Co.() |
2nd Author's Name | Jongsung Park |
2nd Author's Affiliation | Advanced Device Development Dept., ULSI Research Lab., LG Semicon Co. |
3rd Author's Name | Kyungho Lee |
3rd Author's Affiliation | Advanced Device Development Dept., ULSI Research Lab., LG Semicon Co. |
Date | 1995/7/27 |
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Volume (vol) | vol.95 |
Number (no) | 194 |
Page | pp.pp.- |
#Pages | 6 |
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