| Presentation | 1995/4/21 Nano-pattern transfer using an image reversal process with ECR plasma oxidation and its application to fabrication of Si quantum wire Kenji Kurihara, Kazumi Iwadate, Hideo Namatsu, Masao Nagase, Kastumi Murase, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | A new image reversal process has been developed for electron beam nanolithography. This process is based on Si oxidation with ECR oxygen plasma through the opening of resist patterns. After the Si oxidation and resist removal, Si is etched with highly selective Si etching over SiO_2 such as Cl_2-based ECR plasma or KOH anisotropic etching. This image reversal process has achieved 10-nm scale Si line and dot patterns. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | ECR / Plasma oxidation / Electron beam exposure / nanofabrication / image reversal |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1995/4/21(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Nano-pattern transfer using an image reversal process with ECR plasma oxidation and its application to fabrication of Si quantum wire |
| Sub Title (in English) | |
| Keyword(1) | ECR |
| Keyword(2) | Plasma oxidation |
| Keyword(3) | Electron beam exposure |
| Keyword(4) | nanofabrication |
| Keyword(5) | image reversal |
| 1st Author's Name | Kenji Kurihara |
| 1st Author's Affiliation | NTT LSI Laboratories() |
| 2nd Author's Name | Kazumi Iwadate |
| 2nd Author's Affiliation | NTT LSI Laboratories |
| 3rd Author's Name | Hideo Namatsu |
| 3rd Author's Affiliation | NTT LSI Laboratories |
| 4th Author's Name | Masao Nagase |
| 4th Author's Affiliation | NTT LSI Laboratories |
| 5th Author's Name | Kastumi Murase |
| 5th Author's Affiliation | NTT LSI Laboratories |
| Date | 1995/4/21 |
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| Volume (vol) | vol.95 |
| Number (no) | 10 |
| Page | pp.pp.- |
| #Pages | 8 |
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