Presentation 1996/12/6
Evaluation of silicon surface etched with CLF_3 gas
Tadashi Momma, Yoshinori Ishizaki, Yoji Saito,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Surface texturing process has been used to obtain a high efficiency of energy conversion in semiconductor solar cells. In this study, silicon surfaces were isotropically etched by CLF3 gas, and the morphology and the optical reflectance of the etched surfaces were investigated. It is found that the reflectance remarkably decreases by the multi-reflection phenomena in the textured surface. The reflectance of the surface could be reduced in the best condition to less then 1O%.
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Keyword(in English) solar cell / single crystal silicon / CLF3 gas / plasmaless etching / texture / reflectance
Paper # SDM96-159
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Conference Information
Committee SDM
Conference Date 1996/12/6(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Evaluation of silicon surface etched with CLF_3 gas
Sub Title (in English)
Keyword(1) solar cell
Keyword(2) single crystal silicon
Keyword(3) CLF3 gas
Keyword(4) plasmaless etching
Keyword(5) texture
Keyword(6) reflectance
1st Author's Name Tadashi Momma
1st Author's Affiliation Department of Electric Engineering and Electronics, Faculty of Engineering, Seikei University()
2nd Author's Name Yoshinori Ishizaki
2nd Author's Affiliation Department of Electric Engineering and Electronics, Faculty of Engineering, Seikei University
3rd Author's Name Yoji Saito
3rd Author's Affiliation Department of Electric Engineering and Electronics, Faculty of Engineering, Seikei University
Date 1996/12/6
Paper # SDM96-159
Volume (vol) vol.96
Number (no) 396
Page pp.pp.-
#Pages 6
Date of Issue