Presentation 1996/12/5
Oxide-Voltage and Its Polarity Dependence of Interface State Generation in Si MOS Capacitors
Akihiro SHIMADA, Masao INOUE, Junji SHIRAFUJI,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) The generation of two kinds of above-midgap interface states in (100) n-Si MOS capacitors with various oxide thincknesses when subjected to F-N tunneling electron injection has been studied by means of a.c. conductance measurement. The oxide-voltage and its polarity dependence of interface state generation efficiencyη_ are investigatedη_ is always larger by about 2 orders of magnitude when electrons are injected from the gate poly-Si than when they are injected from the Si substrate, andη_ for both polarities depends similarly on the oxide voltages. The critical interface state density D_ for breakdown calculated by usingη_ and Q_ (charge-to-breakdown) reported so far is found relatively independent of oxide voltage and its polarity. This indicate that the number of defects is responsible for TDDB rather than the amount of injected charges. The mechanism of interface state generation and its stress-polarity dependence are hocused
Keyword(in Japanese) (See Japanese page)
Keyword(in English) MOS capacitors / Si/SiO_2 interface states / F-N tunneling electron injection / generation efficiency
Paper # SDM96-151
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Conference Information
Committee SDM
Conference Date 1996/12/5(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Oxide-Voltage and Its Polarity Dependence of Interface State Generation in Si MOS Capacitors
Sub Title (in English)
Keyword(1) MOS capacitors
Keyword(2) Si/SiO_2 interface states
Keyword(3) F-N tunneling electron injection
Keyword(4) generation efficiency
1st Author's Name Akihiro SHIMADA
1st Author's Affiliation Department of Electrical Engineering, Faculty of Engineering, Osaka University()
2nd Author's Name Masao INOUE
2nd Author's Affiliation Department of Electrical Engineering, Faculty of Engineering, Osaka University
3rd Author's Name Junji SHIRAFUJI
3rd Author's Affiliation Department of Electrical Engineering, Faculty of Engineering, Osaka University
Date 1996/12/5
Paper # SDM96-151
Volume (vol) vol.96
Number (no) 395
Page pp.pp.-
#Pages 7
Date of Issue