Presentation | 1996/12/5 Oxide-Voltage and Its Polarity Dependence of Interface State Generation in Si MOS Capacitors Akihiro SHIMADA, Masao INOUE, Junji SHIRAFUJI, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | The generation of two kinds of above-midgap interface states in (100) n-Si MOS capacitors with various oxide thincknesses when subjected to F-N tunneling electron injection has been studied by means of a.c. conductance measurement. The oxide-voltage and its polarity dependence of interface state generation efficiencyη_ |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | MOS capacitors / Si/SiO_2 interface states / F-N tunneling electron injection / generation efficiency |
Paper # | SDM96-151 |
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Conference Information | |
Committee | SDM |
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Conference Date | 1996/12/5(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Oxide-Voltage and Its Polarity Dependence of Interface State Generation in Si MOS Capacitors |
Sub Title (in English) | |
Keyword(1) | MOS capacitors |
Keyword(2) | Si/SiO_2 interface states |
Keyword(3) | F-N tunneling electron injection |
Keyword(4) | generation efficiency |
1st Author's Name | Akihiro SHIMADA |
1st Author's Affiliation | Department of Electrical Engineering, Faculty of Engineering, Osaka University() |
2nd Author's Name | Masao INOUE |
2nd Author's Affiliation | Department of Electrical Engineering, Faculty of Engineering, Osaka University |
3rd Author's Name | Junji SHIRAFUJI |
3rd Author's Affiliation | Department of Electrical Engineering, Faculty of Engineering, Osaka University |
Date | 1996/12/5 |
Paper # | SDM96-151 |
Volume (vol) | vol.96 |
Number (no) | 395 |
Page | pp.pp.- |
#Pages | 7 |
Date of Issue |