| Presentation | 1996/11/14 Evaluation of Activated Chemical Species Generated in RCA Cleaning Solution Kiyotaka Tozuka, Masayuki Kato, Masayuki Toda, Tadahiro Ohmi, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | RCA cleaning method proposed by W.kern et al. has been used empirically for wafer surface cleaning since 1970. However, there has been many uncertain problems in this cleaning method. In this study, the generated active chemical species in RCA cleaning solutions were measured and evaluated to develop the new cleaning technology. As a result, the formation of high reactive OH radical was found to be caused by Fenton reaction in RCA cleaning solutions. It is also revealed that the ratio of hydrogenperoxide to strong acid such as HF, H_2SO_4 and HCl in RCA cleaning solution does not affect on the formation of OH radical. Moreover, it is suggested that anode water of which pH value is controlled can be utilized in RCA cleaning solution instead of strong acid such as HF, H_2SO_4 and HCl. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | RCA cleaning method / OH radical / Fenton reaction / Hydrogenperoxide and Strong acid / Anode water |
| Paper # | SDM96-127 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1996/11/14(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Evaluation of Activated Chemical Species Generated in RCA Cleaning Solution |
| Sub Title (in English) | |
| Keyword(1) | RCA cleaning method |
| Keyword(2) | OH radical |
| Keyword(3) | Fenton reaction |
| Keyword(4) | Hydrogenperoxide and Strong acid |
| Keyword(5) | Anode water |
| 1st Author's Name | Kiyotaka Tozuka |
| 1st Author's Affiliation | Department of Materials Science and Engineering, Faculty of Engineering Yamagata University() |
| 2nd Author's Name | Masayuki Kato |
| 2nd Author's Affiliation | Department of Materials Science and Engineering, Faculty of Engineering Yamagata University |
| 3rd Author's Name | Masayuki Toda |
| 3rd Author's Affiliation | Department of Materials Science and Engineering, Faculty of Engineering Yamagata University |
| 4th Author's Name | Tadahiro Ohmi |
| 4th Author's Affiliation | Department of Electronic Engineering, Faculty of Engineering Tohoku University |
| Date | 1996/11/14 |
| Paper # | SDM96-127 |
| Volume (vol) | vol.96 |
| Number (no) | 359 |
| Page | pp.pp.- |
| #Pages | 8 |
| Date of Issue | |