Presentation 1997/7/24
Effects of Low Resistivity TiN as a Wetting Layer on Submicron Via Contact Filling Process
Young Jung Kim, Heon Do Kim, Sang Ho Yu, Jong Choul Kim, Sang Kyoo Lee,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) In order to improve EM immunity, multi-layered metal structures, such as Ti/Al, TiN/Al, and Ti/TiN/Al, have been employed in Al metallization process. Due to the formation of TiAl_3, and AlN between the interfaces, however, the via resistance of the structures showed higher than expected to be used in high-speed devices. In this study, the use of low resistivity TiN was applied to overcome the problem and, as a result, the Al metallization with high thermal stability and low via resistance, showing the reduction of interfacial reaction was successfully achieved.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Via / low resistivity TiN / wetting layer / TiAl_3 / AlN
Paper # SDM97-51
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Conference Information
Committee SDM
Conference Date 1997/7/24(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Effects of Low Resistivity TiN as a Wetting Layer on Submicron Via Contact Filling Process
Sub Title (in English)
Keyword(1) Via
Keyword(2) low resistivity TiN
Keyword(3) wetting layer
Keyword(4) TiAl_3
Keyword(5) AlN
1st Author's Name Young Jung Kim
1st Author's Affiliation Memory R&D Division, HYUNDAI Electronics Co.()
2nd Author's Name Heon Do Kim
2nd Author's Affiliation Memory R&D Division, HYUNDAI Electronics Co.
3rd Author's Name Sang Ho Yu
3rd Author's Affiliation Memory R&D Division, HYUNDAI Electronics Co.
4th Author's Name Jong Choul Kim
4th Author's Affiliation Memory R&D Division, HYUNDAI Electronics Co.
5th Author's Name Sang Kyoo Lee
5th Author's Affiliation Memory R&D Division, HYUNDAI Electronics Co.
Date 1997/7/24
Paper # SDM97-51
Volume (vol) vol.97
Number (no) 195
Page pp.pp.-
#Pages 4
Date of Issue